发明申请
- 专利标题: CARBON NANOTUBE CONTACT STRUCTURES
- 专利标题(中): 碳纳米管接触结构
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申请号: US11466039申请日: 2006-08-21
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公开(公告)号: US20100112828A1公开(公告)日: 2010-05-06
- 发明人: Benjamin N. Eldridge , John K. Gritters , Igor Y. Khandros , Rod Martens , Gaetan L. Mathieu
- 申请人: Benjamin N. Eldridge , John K. Gritters , Igor Y. Khandros , Rod Martens , Gaetan L. Mathieu
- 专利权人: FormFactor, Inc.
- 当前专利权人: FormFactor, Inc.
- 主分类号: H01R12/00
- IPC分类号: H01R12/00 ; H01R13/02 ; H01R43/16
摘要:
A carbon nanotube contact structure can be used for making pressure connections to a DUT. The contact structure can be formed using a carbon nanotube film or with carbon nanotubes in solution. The carbon nanotube film can be grown in a trench in a sacrificial substrate in which a contact structure such as a beam or contact element is then formed by metal plating. The film can also be formed on a contact element and have metal posts dispersed therein to provide rigidity and elasticity. Contact structures or portions thereof can also be plated with a solution containing carbon nanotubes. The resulting contact structure can be tough, and can provide good electrical conductivity.
公开/授权文献
- US07731503B2 Carbon nanotube contact structures 公开/授权日:2010-06-08
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