Invention Application
- Patent Title: FOREIGN MATTER INSPECTION METHOD AND FOREIGN MATTER INSPECTION APPARATUS
- Patent Title (中): 外部事件检查方法和外部事件检查装置
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Application No.: US12758363Application Date: 2010-04-12
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Publication No.: US20100195095A1Publication Date: 2010-08-05
- Inventor: Hiroyuki YAMASHITA , Mamoru Kobayashi , Eiji Imai , Yoshio Morishige , Koichi Nagoya , Hideki Fukushima
- Applicant: Hiroyuki YAMASHITA , Mamoru Kobayashi , Eiji Imai , Yoshio Morishige , Koichi Nagoya , Hideki Fukushima
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2006-048133 20060224; JP2006-048142 20060224
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
In a foreign matter inspection apparatus comprising: irradiating unit for irradiating inspection light to an inspection area of an article to be inspected; intensity detecting unit for detecting intensity of either reflected light or scattered light, which is generated from the inspection area by irradiating thereto the inspection light; position detecting unit for detecting a position of either the reflected light or the scattered light within the inspection area; and deciding unit for deciding whether or not a foreign matter is present within the inspection area; the foreign matter inspection apparatus is comprised of: display unit capable of displaying thereon both a threshold image in which the threshold value is indicated over an entire area of the inspection area, and a detection sensitivity image indicated by being converted from the threshold image.
Public/Granted literature
- US07986405B2 Foreign matter inspection method and foreign matter inspection apparatus Public/Granted day:2011-07-26
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