Invention Application
US20100213054A1 VACUUM COATING APPARATUS WITH MUTIPLE ANODES AND FILM COATING METHOD USING THE SAME
有权
具有多个阳极的真空涂料装置和使用其的薄膜涂布方法
- Patent Title: VACUUM COATING APPARATUS WITH MUTIPLE ANODES AND FILM COATING METHOD USING THE SAME
- Patent Title (中): 具有多个阳极的真空涂料装置和使用其的薄膜涂布方法
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Application No.: US12548390Application Date: 2009-08-26
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Publication No.: US20100213054A1Publication Date: 2010-08-26
- Inventor: Jin-Bao Wu , Chao-Ying Chen , Chin-Te Shih , Ming-Sheng Leu
- Applicant: Jin-Bao Wu , Chao-Ying Chen , Chin-Te Shih , Ming-Sheng Leu
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Priority: TWTW98105765 20090224
- Main IPC: C23C14/28
- IPC: C23C14/28

Abstract:
A vacuum coating apparatus is disclosed. The apparatus includes a cathode target, a plurality of anodes, a transiting device, a pulsed arc discharge device, and a pulsed laser device. The plurality of anodes is placed on the transiting device and successively passes though a working position by the transiting device. The pulsed arc discharge device is electrically connected to the cathode target and the anode at the operable position to form plasma in a vacuum chamber for film coating. The pulsed laser device is located outside of the vacuum chamber and provides a pulsed laser beam onto the surface of the cathode surface to serve as a plasma trigger. A coating method for the vacuum coating apparatus is also disclosed.
Public/Granted literature
- US08663441B2 Vacuum coating apparatus with mutiple anodes and film coating method using the same Public/Granted day:2014-03-04
Information query
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