公开(公告)号：US08663441B2

公开(公告)日：2014-03-04

申请号：US12548390

申请日：2009-08-26

Applicant: Jin-Bao Wu ,  Chao-Ying Chen ,  Chin-Te Shih ,  Ming-Sheng Leu

Inventor： Jin-Bao Wu ,  Chao-Ying Chen ,  Chin-Te Shih ,  Ming-Sheng Leu

IPC: C25B11/00 ,  C23C14/00 ,  C25B13/00 ,  C23C14/32

CPC classification number: C23C14/325 ,  H01J37/34 ,  H01J37/3438

Abstract: A vacuum coating apparatus is disclosed. The apparatus includes a cathode target, a plurality of anodes, a transiting device, a pulsed arc discharge device, and a pulsed laser device. The plurality of anodes is placed on the transiting device and successively passes though a working position by the transiting device. The pulsed arc discharge device is electrically connected to the cathode target and the anode at the operable position to form plasma in a vacuum chamber for film coating. The pulsed laser device is located outside of the vacuum chamber and provides a pulsed laser beam onto the surface of the cathode surface to serve as a plasma trigger. A coating method for the vacuum coating apparatus is also disclosed.

Abstract translation: 公开了真空镀膜装置。 该装置包括阴极靶，多个阳极，过渡装置，脉冲电弧放电装置和脉冲激光装置。 多个阳极被放置在过渡装置上，并且通过过渡装置连续地通过工作位置。 脉冲电弧放电装置在可操作位置处电连接到阴极靶和阳极，以在用于膜涂覆的真空室中形成等离子体。 脉冲激光器件位于真空室的外部，并且将脉冲激光束提供到阴极表面上以用作等离子体触发器。 还公开了一种真空镀膜设备的涂布方法。

公开(公告)号：US20100213054A1

公开(公告)日：2010-08-26

申请号：US12548390

申请日：2009-08-26

Applicant: Jin-Bao Wu ,  Chao-Ying Chen ,  Chin-Te Shih ,  Ming-Sheng Leu

Inventor： Jin-Bao Wu ,  Chao-Ying Chen ,  Chin-Te Shih ,  Ming-Sheng Leu

IPC: C23C14/28

CPC classification number: C23C14/325 ,  H01J37/34 ,  H01J37/3438

Abstract: A vacuum coating apparatus is disclosed. The apparatus includes a cathode target, a plurality of anodes, a transiting device, a pulsed arc discharge device, and a pulsed laser device. The plurality of anodes is placed on the transiting device and successively passes though a working position by the transiting device. The pulsed arc discharge device is electrically connected to the cathode target and the anode at the operable position to form plasma in a vacuum chamber for film coating. The pulsed laser device is located outside of the vacuum chamber and provides a pulsed laser beam onto the surface of the cathode surface to serve as a plasma trigger. A coating method for the vacuum coating apparatus is also disclosed.

Abstract translation: 公开了真空镀膜装置。 该装置包括阴极靶，多个阳极，过渡装置，脉冲电弧放电装置和脉冲激光装置。 多个阳极被放置在过渡装置上，并且通过过渡装置连续地通过工作位置。 脉冲电弧放电装置在可操作位置处电连接到阴极靶和阳极，以在用于膜涂覆的真空室中形成等离子体。 脉冲激光器件位于真空室的外部，并且将脉冲激光束提供到阴极表面上以用作等离子体触发器。 还公开了一种真空镀膜设备的涂布方法。