Invention Application
US20100224592A1 CHARGED PARTICLE BEAM PROCESSING 有权
充电颗粒光束处理

CHARGED PARTICLE BEAM PROCESSING
Abstract:
Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.
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