Invention Application
- Patent Title: CHARGED PARTICLE BEAM PROCESSING
- Patent Title (中): 充电颗粒光束处理
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Application No.: US12719619Application Date: 2010-03-08
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Publication No.: US20100224592A1Publication Date: 2010-09-09
- Inventor: MILOS TOTH , Richard J. Young , Alexander Henstra , Alan Frank de Jong , Johannes Jacobus Lambertus Mulders
- Applicant: MILOS TOTH , Richard J. Young , Alexander Henstra , Alan Frank de Jong , Johannes Jacobus Lambertus Mulders
- Applicant Address: US OR Hillsboro
- Assignee: FEI COMPANY
- Current Assignee: FEI COMPANY
- Current Assignee Address: US OR Hillsboro
- Main IPC: C23F1/00
- IPC: C23F1/00 ; H01J37/10 ; H01J37/147 ; H01J37/305 ; C23C16/44 ; C23C14/22

Abstract:
Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.
Public/Granted literature
- US08598542B2 Charged particle beam processing Public/Granted day:2013-12-03
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