发明申请
- 专利标题: PULSED LASER MICRO-DEPOSITION PATTERN FORMATION
- 专利标题(中): 脉冲激光微沉积图形成
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申请号: US12400438申请日: 2009-03-09
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公开(公告)号: US20100227133A1公开(公告)日: 2010-09-09
- 发明人: Bing Liu , Zhendong Hu , Makoto Murakami , Jingzhou Xu , Yong Che
- 申请人: Bing Liu , Zhendong Hu , Makoto Murakami , Jingzhou Xu , Yong Che
- 申请人地址: US MI Ann Arbor
- 专利权人: IMRA AMERICA, INC.
- 当前专利权人: IMRA AMERICA, INC.
- 当前专利权人地址: US MI Ann Arbor
- 主分类号: B32B3/00
- IPC分类号: B32B3/00 ; C23C14/34 ; C23C14/00
摘要:
A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.
公开/授权文献
- US08663754B2 Pulsed laser micro-deposition pattern formation 公开/授权日:2014-03-04
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