发明申请
US20100230387A1 Shower Plate, Method for Manufacturing the Shower Plate, Plasma Processing Apparatus using the Shower Plate, Plasma Processing Method and Electronic Device Manufacturing Method
有权
淋浴板，淋浴板制造方法，使用淋浴板的等离子体处理装置，等离子体处理方法和电子装置制造方法
- 专利标题： Shower Plate, Method for Manufacturing the Shower Plate, Plasma Processing Apparatus using the Shower Plate, Plasma Processing Method and Electronic Device Manufacturing Method
- 专利标题（中）： 淋浴板，淋浴板制造方法，使用淋浴板的等离子体处理装置，等离子体处理方法和电子装置制造方法
-
申请号： US12308333申请日： 2007-06-13
-
公开(公告)号： US20100230387A1公开(公告)日： 2010-09-16
- 发明人: Masahiro Okesaku , Tetsuya Goto , Tadahiro Ohmi , Kiyotaka Ishibashi
- 申请人： Masahiro Okesaku , Tetsuya Goto , Tadahiro Ohmi , Kiyotaka Ishibashi
- 申请人地址： JP Minato-ku, Tokyo JP Sendai, Miyagi
- 专利权人： TOKYO ELECTRON LIMITED,NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- 当前专利权人： TOKYO ELECTRON LIMITED,NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- 当前专利权人地址： JP Minato-ku, Tokyo JP Sendai, Miyagi
- 优先权： JP2006-163357 20060613; JP2006-198754 20060720; JP2007-153563 20070611
- 国际申请： PCT/JP2007/061857 WO 20070613
- 主分类号： C23F1/08
- IPC分类号： C23F1/08 ; C23C16/00 ; C23F1/00 ; C23C16/455 ; C23C16/511 ; B22F3/12 ; B28B1/00
摘要：
Occurrence of a back-flow of plasma or ignition of gas for plasma excitation in a longitudinal hole portion can be prevented more completely, and a shower plate in which efficient plasma excitation is possible is provided. In shower plate 105, which is arranged in processing chamber 102 of a plasma processing apparatus and discharges gas for plasma excitation into processing chamber, porous-gas passing body 114 having a pore that communicates in the gas flow direction is fixed onto longitudinal hole 112 used as a discharging path of gas for plasma excitation. The pore diameter of a narrow path in a gas flowing path formed of a pore, which communicates to porous-gas passing body 114, is 10 μm or lower.