发明申请
- 专利标题： POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND
- 专利标题（中）： 正极性组合物，形成耐火模式的方法和聚合物
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申请号： US12721240申请日： 2010-03-10
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公开(公告)号： US20100233625A1公开(公告)日： 2010-09-16
- 发明人: Tomoyuki Hirano , Tasuku Matsumiya , Daiju Shiono , Takahiro Dazai
- 申请人： Tomoyuki Hirano , Tasuku Matsumiya , Daiju Shiono , Takahiro Dazai
- 申请人地址： JP Kawasaki-shi
- 专利权人： TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人： TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人地址： JP Kawasaki-shi
- 优先权： JP2009-056809 20090310
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20 ; C08F28/06
摘要：
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid, and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) having an aromatic group, a structural unit (a5) represented by general formula (a5-1) shown below, and a structural unit (a1) containing an acid-dissociable, dissolution-inhibiting group. In the formula (a5-1), R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.
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