发明申请
US20100233626A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
有权
正电阻组合物和形成电阻图案的方法
- 专利标题： POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- 专利标题（中）： 正电阻组合物和形成电阻图案的方法
-
申请号： US12721291申请日： 2010-03-10
-
公开(公告)号： US20100233626A1公开(公告)日： 2010-09-16
- 发明人: Hiroaki Shimizu , Hideto Nito , Junichi Tsuchiya , Takahiro Dazai
- 申请人： Hiroaki Shimizu , Hideto Nito , Junichi Tsuchiya , Takahiro Dazai
- 申请人地址： JP Kawasaki-shi
- 专利权人： TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人： TOKYO OHKA KOGYO CO., LTD.
- 当前专利权人地址： JP Kawasaki-shi
- 优先权： JP2009-057167 20090310
- 主分类号： G03F7/027
- IPC分类号： G03F7/027 ; G03F7/20
摘要：
A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid-generator component (B) and a fluorine-containing polymeric compound (F1) having a structural unit containing a base dissociable group.
公开/授权文献
信息查询
IPC分类:
