Positive resist composition and method of forming resist pattern
    1.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号:US08323869B2

    公开(公告)日:2012-12-04

    申请号:US12721291

    申请日:2010-03-10

    IPC分类号: G03C1/00 G03F1/00 G03F7/00

    摘要: A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid-generator component (B) and a fluorine-containing polymeric compound (F1) having a structural unit containing a base dissociable group.

    摘要翻译: 一种正性抗蚀剂组合物,其包含具有由通式(a0-1)表示的结构单元(a0)的聚合化合物(A1)(R表示氢原子,1〜5个碳原子的烷基或卤代烷基1 至5个碳原子,R 2表示二价连接基团,R 3表示在其环骨架中含有-SO 2 - 的环状基团)和衍生自含有酸解离,溶解抑制基团的酸的丙烯酸酯的结构单元(a1) - 发酵剂组分(B)和含有碱解离基团的结构单元的含氟聚合物(F1)。

    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    2.
    发明申请
    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    正电阻组合物和形成电阻图案的方法

    公开(公告)号:US20100233626A1

    公开(公告)日:2010-09-16

    申请号:US12721291

    申请日:2010-03-10

    IPC分类号: G03F7/027 G03F7/20

    摘要: A positive resist composition including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, an acid-generator component (B) and a fluorine-containing polymeric compound (F1) having a structural unit containing a base dissociable group.

    摘要翻译: 一种正性抗蚀剂组合物,其包含具有由通式(a0-1)表示的结构单元(a0)的聚合化合物(A1)(R表示氢原子,1〜5个碳原子的烷基或卤代烷基1 至5个碳原子,R 2表示二价连接基团,R 3表示在其环骨架中含有-SO 2 - 的环状基团)和衍生自含有酸解离,溶解抑制基团的酸的丙烯酸酯的结构单元(a1) - 发酵剂组分(B)和含有碱解离基团的结构单元的含氟聚合物(F1)。

    Perforator
    5.
    发明授权

    公开(公告)号:US6128986A

    公开(公告)日:2000-10-10

    申请号:US917384

    申请日:1997-08-26

    摘要: A perforator for making perforations in a continuous film which is thereafter cut into individual filmstrips having variable lengths. A die set unit of the perforator has a plurality of punches and corresponding dies which are respectively arranged along the continuous film. The die set unit performs die-punching N times (N=1, 2, 3 . . . ) in every first section having a variable length Lx, and the measuring feeder transports the continuous film by a first length after each of (N-1) times die-punching and by a second length after the last die-punching for every first section. The first length is given as Lx/N, and the second length corresponds to the first length plus the length L2 of a second section disposed alternately with the first section along the continuous film. In alternative, the die set unit is constituted of first to nth die sets aligned in order from downstream to in the film transporting direction. The ith die set of the die sets has a number Gi (i=1, 2, . . . n) of punches as a segment of the total punches. The first to ith die sets are simultaneously activated to perform die-punching. The number is selected depending on the number F of frame exposure locations to be provided in each individual filmstrip.

    Resist composition, and method of forming resist pattern
    6.
    发明授权
    Resist composition, and method of forming resist pattern 有权
    抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号:US08658343B2

    公开(公告)日:2014-02-25

    申请号:US13373965

    申请日:2011-12-05

    IPC分类号: G03F7/004 G03F7/039

    摘要: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-1). In formula (a5-1), R represents a hydrogen atom, an alkyl group or a halogenated alkyl group, X represents single bond or divalent linking group, W represents a cyclic alkylene group which may include an oxygen atom at arbitrary position, each of Ra and Rb independently represents a hydrogen atom or an alkyl group which may include an oxygen atom at arbitrary position, or alternatively, Ra and Rb may be bonded to each other to form a ring together with the nitrogen atom in the formula, and p represents integer of 1 to 3.

    摘要翻译: 一种抗蚀剂组合物,其包含在酸的作用下在显影溶液中显示出改变的溶解性的碱成分(A)和曝光时产生酸的酸产生剂成分(B),其中,所述碱成分(A)含有高分子化合物 A1)具有由通式(a5-1)表示的结构单元(a5)。 式(a5-1)中,R表示氢原子,烷基或卤代烷基,X表示单键或二价连接基,W表示可以在任意位置含有氧原子的环状亚烷基, Ra和Rb独立地表示氢原子或可以在任意位置包含氧原子的烷基,或者Ra和Rb可以与式中的氮原子一起形成环,p表示 1〜3的整数。

    Method of perforating film
    8.
    发明授权
    Method of perforating film 失效
    穿膜方法

    公开(公告)号:US5746100A

    公开(公告)日:1998-05-05

    申请号:US704977

    申请日:1996-08-28

    摘要: A method for making perforations in a continuous film which is thereafter cut into individual filmstrips having variable lengths. A die set unit of the perforator has a plurality of punches and corresponding dies which are respectively arranged along the continuous film. The die set unit performs die-punching N times (N=1, 2, 3 . . .) in every first section having a variable length Lx, and the measuring feeder transports the continuous film by a first length after each of (N-1) times die-punching and by a second length after the last die-punching for every first section. The first length is given as Lx/N, and the second length corresponds to the first length plus the length L2 of a second section disposed alternately with the first section along the continuous film. In alternative, the die set unit is constituted of first to nth die sets aligned in order from downstream to in the film transporting direction. The ith die set of the die sets has a number Gi (i=1, 2, . . . n) of punches as a segment of the total punches. The first to ith die sets are simultaneously activated to perform die-punching. The number is selected depending on the number F of frame exposure locations to be provided in each individual filmstrip.

    摘要翻译: 一种在连续膜中进行穿孔的方法,其后切割成具有可变长度的单个胶片。 穿孔器的模具单元具有分别沿着连续膜设置的多个冲头和相应的模具。 模具组件在具有可变长度Lx的每个第一部分中执行冲压N次(N = 1,2,3,...),并且测量供给器在(N- 对于每个第一部分,在最后冲压之后进行1次冲压和第二长度。 第一长度以Lx / N给出,第二长度对应于沿连续膜与第一部分交替布置的第二部分的第一长度加上长度L2。 替代地,模具组件由从下游到膜输送方向的顺序排列的第一至第n模具组成。 模具的第i个模具具有数字Gi(i = 1,2,...)作为整个冲头的一部分。 同时激活第一台模具进行冲压。 根据要在每个单独的幻灯片中提供的帧曝光位置的数量F来选择该数量。