发明申请
US20100292824A1 SYSTEM AND METHOD FOR IMPLEMENTING A WAFER ACCEPTANCE TEST ("WAT") ADVANCED PROCESS CONTROL ("APC") WITH NOVEL SAMPLING POLICY AND ARCHITECTURE
有权
用新的采样政策和架构实施水轮接收测试（“WAT”）高级过程控制（“APC”）的系统和方法
- 专利标题： SYSTEM AND METHOD FOR IMPLEMENTING A WAFER ACCEPTANCE TEST ("WAT") ADVANCED PROCESS CONTROL ("APC") WITH NOVEL SAMPLING POLICY AND ARCHITECTURE
- 专利标题（中）： 用新的采样政策和架构实施水轮接收测试（“WAT”）高级过程控制（“APC”）的系统和方法
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申请号： US12465064申请日： 2009-05-13
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公开(公告)号： US20100292824A1公开(公告)日： 2010-11-18
- 发明人: Andy Tsen , Jo Fei Wang , Po-Feng Tsai , Ming-Yu Fan , Jill Wang , Jong-I Mou , Sunny Wu
- 申请人： Andy Tsen , Jo Fei Wang , Po-Feng Tsai , Ming-Yu Fan , Jill Wang , Jong-I Mou , Sunny Wu
- 申请人地址： TW Hsin-Chu
- 专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址： TW Hsin-Chu
- 主分类号： G05B13/04
- IPC分类号： G05B13/04
摘要：
System and method for implementing wafer acceptance test (“WAT”) advanced process control (“APC”) are described. In one embodiment, the method comprises performing a key process on a sample number of wafers of a lot of wafers; performing a key inline measurement related to the key process to produce metrology data for the wafers; predicting WAT data from the metrology data using an inline-to-WAT model; and using the predicted WAT data to tune a WAT APC process for controlling a tuning process or a process APC process.