发明申请
- 专利标题: PHOTODIODE AND METHOD OF FABRICATING PHOTODIODE
- 专利标题(中): 光致变色剂及其制备方法
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申请号: US12781850申请日: 2010-05-18
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公开(公告)号: US20100295145A1公开(公告)日: 2010-11-25
- 发明人: Kenichi Miyazaki , Osamu Matsushima
- 申请人: Kenichi Miyazaki , Osamu Matsushima
- 申请人地址: JP Kyoto-fu
- 专利权人: Rohm Co., Ltd.
- 当前专利权人: Rohm Co., Ltd.
- 当前专利权人地址: JP Kyoto-fu
- 优先权: JP2009-120769 20090519; JP2009-297205 20091228
- 主分类号: H01L31/105
- IPC分类号: H01L31/105 ; H01L31/18 ; H01L31/0264
摘要:
A light-absorbing layer is composed of a compound-semiconductor film of charcopyrite structure, a surface layer is disposed on the light-absorbing layer, the surface layer having a higher band gap energy than the compound-semiconductor film, an upper electrode layer is disposed on the surface layer, and a lower electrode layer is disposed on a backside of the light-absorbing layer in opposition to the upper electrode layer, the upper electrode layer and the lower electrode layer having a reverse bias voltage applied in between to detect electric charges produced by photoelectric conversion in the compound-semiconductor film, as electric charges due to photoelectric conversion are multiplied by impact ionization, while the multiplication by impact ionization of electric charges is induced by application of a high-intensity electric field to a semiconductor of charcopyrite structure, allowing for an improved dark-current property, and an enhanced efficiency even in detection of low illumination intensities, with an enhanced S/N ratio.
公开/授权文献
- US08378444B2 Photodiode and method of fabricating photodiode 公开/授权日:2013-02-19
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