发明申请
- 专利标题: Controlled vapor deposition of multilayered coatings adhered by an oxide layer
- 专利标题(中): 由氧化物层附着的多层涂层的受控气相沉积
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申请号: US12804866申请日: 2010-07-29
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公开(公告)号: US20100304132A1公开(公告)日: 2010-12-02
- 发明人: Boris Kobrin , Jeffrey D. Chinn , Romuald Nowak , Richard C. Yi
- 申请人: Boris Kobrin , Jeffrey D. Chinn , Romuald Nowak , Richard C. Yi
- 专利权人: Applied Microstructures, Inc.
- 当前专利权人: Applied Microstructures, Inc.
- 主分类号: C23C16/40
- IPC分类号: C23C16/40
摘要:
An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.
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