发明申请
- 专利标题: Method for manufacturing III metal nitride single crystal
- 专利标题(中): III型金属氮化物单晶的制造方法
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申请号: US12804521申请日: 2010-07-23
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公开(公告)号: US20100307404A1公开(公告)日: 2010-12-09
- 发明人: Takayuki Hirao , Katsuhiro Imai , Mikiya Ichimura
- 申请人: Takayuki Hirao , Katsuhiro Imai , Mikiya Ichimura
- 申请人地址: JP Nagoya-City
- 专利权人: NGK Insulators, Ltd.
- 当前专利权人: NGK Insulators, Ltd.
- 当前专利权人地址: JP Nagoya-City
- 优先权: JP2008-13689 20080124
- 主分类号: C30B19/12
- IPC分类号: C30B19/12
摘要:
It is used a substrate main body 1 having a side face 1b and a pair of main faces 1a and an underlying film 2 of a single crystal of a nitride of a metal belonging to the group III formed at least on one main face of the substrate main body 1. A single crystal 3 of a nitride of a metal belonging to the group III is grown on the main face 1a of the substrate main body 1 by a liquid phase process. The underlying film 2 has a shape of a convex figure in a plan view. A surface 4 without the underlying film thereon surrounds the entire circumference of the underlying film 2 The single crystal 3 of a nitride of a metal belonging to the group III grown on the underlying film 2 is not brought into contact with a single crystal of a nitride of a metal belonging to group III formed on another underlying film.
公开/授权文献
- US07988784B2 Method for manufacturing III metal nitride single crystal 公开/授权日:2011-08-02
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