发明申请
- 专利标题: PHOTOELECTRIC CONVERSION DEVICE, MANUFACTURING METHOD THEREOF AND SEMICONDUCTOR DEVICE
- 专利标题(中): 光电转换装置及其半导体装置的制造方法
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申请号: US12821201申请日: 2010-06-23
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公开(公告)号: US20100330729A1公开(公告)日: 2010-12-30
- 发明人: Yuusuke Sugawara , Kazuo Nishi , Tatsuya Arao , Daiki Yamada , Hidekazu Takahashi , Naoto Kusumoto
- 申请人: Yuusuke Sugawara , Kazuo Nishi , Tatsuya Arao , Daiki Yamada , Hidekazu Takahashi , Naoto Kusumoto
- 申请人地址: JP Kanagawa-ken
- 专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址: JP Kanagawa-ken
- 优先权: JP2005-148583 20050520
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; H01L31/0232
摘要:
The present invention provides a photoelectric conversion device in which a leakage current is suppressed. A photoelectric conversion device of the present invention comprises: a first electrode over a substrate; a photoelectric conversion layer including a first conductive layer having one conductivity, a second semiconductor layer, and a third semiconductor layer having a conductivity opposite to the one conductivity of the second semiconductor layer over the first electrode, wherein an end portion of the first electrode is covered with the first semiconductor layer; an insulating film, and a second electrode electrically connected to the third semiconductor film with the insulating film therebetween, over the insulating film, are formed over the third semiconductor film, and wherein a part of the second semiconductor layer and a part of the third semiconductor layer is removed in a region of the photoelectric conversion layer, which is not covered with the insulating film.
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