发明申请
- 专利标题： PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- 专利标题（中）： 微波投影曝光装置的投影目标
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申请号： US12896128申请日： 2010-10-01
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公开(公告)号： US20110019169A1公开(公告)日： 2011-01-27
- 发明人: Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
- 申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
- 申请人地址： DE Oberkochen
- 专利权人： CARL ZEISS SMT AG
- 当前专利权人： CARL ZEISS SMT AG
- 当前专利权人地址： DE Oberkochen
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
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