发明申请
US20110042746A1 SINGLE TRANSISTOR MEMORY DEVICE HAVING SOURCE AND DRAIN INSULATING REGIONS AND METHOD OF FABRICATING THE SAME
审中-公开
具有源极和漏极绝缘区域的单晶体管存储器件及其制造方法
- 专利标题: SINGLE TRANSISTOR MEMORY DEVICE HAVING SOURCE AND DRAIN INSULATING REGIONS AND METHOD OF FABRICATING THE SAME
- 专利标题(中): 具有源极和漏极绝缘区域的单晶体管存储器件及其制造方法
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申请号: US12940304申请日: 2010-11-05
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公开(公告)号: US20110042746A1公开(公告)日: 2011-02-24
- 发明人: Nam-Kyun Tak , Ki-Whan Song , Chang-Woo Oh , Woo-Yeong Cho
- 申请人: Nam-Kyun Tak , Ki-Whan Song , Chang-Woo Oh , Woo-Yeong Cho
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2006-0107345 20061101; KR10-2006-0119087 20061129
- 主分类号: H01L29/772
- IPC分类号: H01L29/772
摘要:
A single transistor floating-body dynamic random access memory (DRAM) device includes a floating body located on a semiconductor substrate and a gate electrode located on the floating body, the floating body including an excess carrier storage region. The DRAM device further includes source and drain regions respectively located at both sides of the gate electrode, and leakage shielding patterns located between the floating body and the source and drain regions. Each of the source and drain regions contact the floating body, which may be positioned between the source and drain regions. The floating body may also laterally extend under the leakage shielding patterns, which may be arranged at outer sides of the gate electrode.
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