发明申请
- 专利标题： HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 热管，光刻设备和器件制造方法
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申请号： US12891375申请日： 2010-09-27
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公开(公告)号： US20110075118A1公开(公告)日： 2011-03-31
- 发明人: Johannes Henricus Wilhelmus JACOBS , Nicolaas Ten Kate , Joost Jeroen Ottens , Gerrit Van Donk , Johannes Ven Es
- 申请人： Johannes Henricus Wilhelmus JACOBS , Nicolaas Ten Kate , Joost Jeroen Ottens , Gerrit Van Donk , Johannes Ven Es
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; F24H1/10
摘要：
A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.