发明申请
- 专利标题: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH
- 专利标题(中): 丙酸敏感或辐射敏感性树脂组合物及其形成方法
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申请号: US12895504申请日: 2010-09-30
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公开(公告)号: US20110081612A1公开(公告)日: 2011-04-07
- 发明人: Kana FUJII , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
- 申请人: Kana FUJII , Takamitsu Tomiga , Toru Tsuchihashi , Kazuyoshi Mizutani , Jiro Yokoyama , Shinichi Sugiyama , Shuji Hirano , Toru Fujimori
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-094251 20080331; JP2008-331732 20081226
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/20
摘要:
According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.
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