公开(公告)号：US09122151B2

公开(公告)日：2015-09-01

申请号：US13406165

申请日：2012-02-27

Applicant: Kana Fujii ,  Hidenori Takahashi ,  Fumiyuki Nishiyama

Inventor： Kana Fujii ,  Hidenori Takahashi ,  Fumiyuki Nishiyama

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/039 ,  G03F7/32 ,  B23B3/10

CPC classification number: G03F7/004 ,  B23B3/10 ,  B32B3/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: A resist composition includes a resin (A) containing any of repeating units (a) of general formulae (I-a) and (I-b) below and any of repeating units (b) of general formula (II) below but containing substantially no repeating unit in which an alcoholic hydroxyl group is introduced, and any of compounds (B) of general formulae (III-a) and (III-b) below.

Abstract translation: 抗蚀剂组合物包含含有下述通式（Ia）和（Ib）的重复单元（a）和下述通式（II）的重复单元（b）中任何一种但基本上不含重复单元的树脂（A） 其中引入醇羟基，以及通式（III-a）和（III-b）的化合物（B）中的任何一种。

公开(公告)号：US08877423B2

公开(公告)日：2014-11-04

申请号：US13378387

申请日：2010-06-30

Applicant: Kana Fujii ,  Toru Fujimori

Inventor： Kana Fujii ,  Toru Fujimori

IPC: G03F7/004 ,  G03F7/028

CPC classification number: G03F7/0048 ,  C08F8/02 ,  C08F12/22 ,  C08F12/24 ,  C08F12/32 ,  C08F212/14 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0397 ,  C08F220/10 ,  C08F2220/1841

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.

Abstract translation: 一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）含有本说明书中定义的式（I）表示的重复单元的树脂，由说明书中定义的式（II）表示的重复单元和 由本说明书中定义的式（III-a）或（III-b）表示的重复单元; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）溶剂，其中溶剂（C）含有乳酸乙酯，并且提供使用该组合物的膜和图案形成方法。

公开(公告)号：US08741542B2

公开(公告)日：2014-06-03

申请号：US13512633

申请日：2010-11-30

Applicant: Tomotaka Tsuchimura ,  Takayuki Ito ,  Toru Fujimori ,  Kana Fujii

Inventor： Tomotaka Tsuchimura ,  Takayuki Ito ,  Toru Fujimori ,  Kana Fujii

IPC: G03F7/027 ,  G03F7/039 ,  G03F7/30

CPC classification number: G03F7/0045 ,  C09B69/101 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/091

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a specific compound represented by a general formula, (B) a resin which is alkali-insoluble or sparingly alkali-soluble and becomes easily alkali-soluble in the presence of an acid, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a film formed using the composition; and a pattern forming method using the same.

Abstract translation: 本发明提供一种光化射线敏感性或辐射敏感性树脂组合物，其包含（A）由通式表示的特定化合物，（B）在碱存在下碱不溶性或微溶碱性并易于碱溶解的树脂 的酸，和（C）能够在用光化射线或辐射照射时能够产生酸的化合物; 使用该组合物形成的膜; 以及使用该图案形成方法的图案形成方法。

公开(公告)号：US08647812B2

公开(公告)日：2014-02-11

申请号：US13636834

申请日：2011-03-18

Applicant: Kana Fujii ,  Shinji Tarutani

Inventor： Kana Fujii ,  Shinji Tarutani

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/028 ,  G03F7/40

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10T428/24479

Abstract: A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains (A) a resin capable of increasing the polarity to decrease the solubility for an organic solvent-containing developer by the action of an acid, (B) at least one kind of a compound capable of generating a sulfonic acid represented by the specific formula upon irradiation with an actinic ray or radiation, and (C) a solvent.

Abstract translation: 一种图案形成方法，包括（i）从化学放大抗蚀剂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过使用含有机溶剂的显影剂使曝光的膜显影的步骤 ，其中抗蚀剂组合物含有（A）能够通过酸作用增加极性以降低对含有机溶剂的显影剂的溶解度的树脂，（B）至少一种能够产生磺酸的化合物 由光化射线或辐射照射时的具体式表示，和（C）溶剂。

公开(公告)号：US20130011619A1

公开(公告)日：2013-01-10

申请号：US13636834

申请日：2011-03-18

Applicant: Kana Fujii ,  Shinji Tarutani

Inventor： Kana Fujii ,  Shinji Tarutani

IPC: G03F7/20 ,  B32B3/30

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10T428/24479

Abstract: A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains (A) a resin capable of increasing the polarity to decrease the solubility for an organic solvent-containing developer by the action of an acid, (B) at least one kind of a compound capable of generating a sulfonic acid represented by the specific formula upon irradiation with an actinic ray or radiation, and (C) a solvent.

Abstract translation: 一种图案形成方法，包括（i）从化学放大抗蚀剂组合物形成膜的步骤，（ii）曝光所述膜的步骤，以及（iii）通过使用含有机溶剂的显影剂使曝光的膜显影的步骤 ，其中抗蚀剂组合物含有（A）能够通过酸作用增加极性以降低对含有机溶剂的显影剂的溶解度的树脂，（B）至少一种能够产生磺酸的化合物 由光化射线或辐射照射时的具体式表示，和（C）溶剂。

公开(公告)号：US20120321855A1

公开(公告)日：2012-12-20

申请号：US13580921

申请日：2011-02-24

Applicant: Kaoru Iwato ,  Shohei Kataoka ,  Shinji Tarutani ,  Sou Kamimura ,  Keita Kato ,  Yuichiro Enomoto ,  Kazuyoshi Mizutani ,  Toru Tsuchihashi ,  Kana Fujii

Inventor： Kaoru Iwato ,  Shohei Kataoka ,  Shinji Tarutani ,  Sou Kamimura ,  Keita Kato ,  Yuichiro Enomoto ,  Kazuyoshi Mizutani ,  Toru Tsuchihashi ,  Kana Fujii

IPC: G03F7/027 ,  B32B3/30 ,  G03F7/004 ,  G03F7/20 ,  C08F224/00

CPC classification number: G03F7/30 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  Y10T428/24479

Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

Abstract translation: 提供了形成图案的方法，确保优异的灵敏度，限制分辨率，粗糙度特性，曝光宽容度（EL），对曝光后烘烤（PEB）温度和聚焦宽度（焦深DOF）的依赖性以及抗蚀剂组合物 用于该方法。 该方法包括（A）由抗蚀剂组合物形成膜，所述抗蚀剂组合物含有含有重复单元的树脂，所述树脂含有当被酸作用时分解的基团，从而产生醇羟基，所述树脂当被酸作用时降低 其在含有有机溶剂的显影剂中的溶解度，（B）将膜曝光，和（C）使用含有有机溶剂的显影剂显影曝光膜。

公开(公告)号：US20110081612A1

公开(公告)日：2011-04-07

申请号：US12895504

申请日：2010-09-30

Applicant: Kana FUJII ,  Takamitsu Tomiga ,  Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Jiro Yokoyama ,  Shinichi Sugiyama ,  Shuji Hirano ,  Toru Fujimori

Inventor： Kana FUJII ,  Takamitsu Tomiga ,  Toru Tsuchihashi ,  Kazuyoshi Mizutani ,  Jiro Yokoyama ,  Shinichi Sugiyama ,  Shuji Hirano ,  Toru Fujimori

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0392 ,  C08F8/12 ,  C08F12/22 ,  C08F214/18 ,  C08F220/18 ,  C08F220/22 ,  C08F220/32 ,  C08F2220/282 ,  C08K5/375 ,  C08K5/42 ,  C08L33/068 ,  C08L51/04 ,  C08L67/02 ,  C09D125/14 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  C08F212/14 ,  C08F2220/1825 ,  C08F2220/185 ,  C08F220/14

Abstract: According to one embodiment, an actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin containing the repeating units of formulae (I), (II) and (III) that when acted on by an acid, becomes soluble in an alkali developer, and (B) a compound that when irradiated with actinic rays or radiation, generates a fluorine-containing acid, wherein each of R1 independently represents a hydrogen atom or an optionally substituted methyl group, R2 represents a halogen atom, an optionally substituted alkyl group, an optionally substituted cycloalkyl group, an optionally substituted aryl group or an optionally substituted aralkyl group, and n is an integer of 0 to 5, provided that when n is 2 or greater, multiple R2s may be identical to or different from each other.

Abstract translation: 根据一个实施方案，光化射线敏感或辐射敏感性树脂组合物包含（A）含有式（I），（II）和（III）的重复单元的树脂，当被酸作用时，其变得易溶于 碱显影剂和（B）当用光化射线或辐射照射时产生含氟酸的化合物，其中R 1各自独立地表示氢原子或任选取代的甲基，R 2表示卤素原子，任选地 取代的烷基，任选取代的环烷基，任选取代的芳基或任选取代的芳烷基，n为0至5的整数，条件是当n为2或更大时，多个R 2可以相同或不同 彼此。

公开(公告)号：US09709892B2

公开(公告)日：2017-07-18

申请号：US13637269

申请日：2011-03-25

Applicant: Shohei Kataoka ,  Kaoru Iwato ,  Sou Kamimura ,  Toru Tsuchihashi ,  Yuichiro Enomoto ,  Kana Fujii ,  Kazuyoshi Mizutani ,  Shinji Tarutani ,  Keita Kato

Inventor： Shohei Kataoka ,  Kaoru Iwato ,  Sou Kamimura ,  Toru Tsuchihashi ,  Yuichiro Enomoto ,  Kana Fujii ,  Kazuyoshi Mizutani ,  Shinji Tarutani ,  Keita Kato

IPC: G03F7/30 ,  G03F7/039 ,  G03F7/075 ,  C08F220/28 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  G03F7/038 ,  C08F232/08

CPC classification number: G03F7/30 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/325 ,  Y10T428/24802

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧−1.5 when exposed to actinic rays or radiation.

公开(公告)号：US09551935B2

公开(公告)日：2017-01-24

申请号：US13636965

申请日：2011-03-25

Applicant: Keita Kato ,  Shinji Tarutani ,  Toru Tsuchihashi ,  Sou Kamimura ,  Yuichiro Enomoto ,  Kana Fujii ,  Kaoru Iwato ,  Shohei Kataoka ,  Kazuyoshi Mizutani

Inventor： Keita Kato ,  Shinji Tarutani ,  Toru Tsuchihashi ,  Sou Kamimura ,  Yuichiro Enomoto ,  Kana Fujii ,  Kaoru Iwato ,  Shohei Kataoka ,  Kazuyoshi Mizutani

IPC: G03F7/32 ,  G03F7/039 ,  G03F7/20 ,  G03F7/004 ,  G03F7/075

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/2041 ,  Y10T428/24

Abstract: Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and ΔSP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent. ΔSP=SPF−SPI  (1)

Abstract translation: 提供了一种形成图案的方法，确保优异的曝光宽容度（EL）和聚焦纬度（焦深DOF）。 形成图案的方法包括（A）从抗蚀剂组合物形成膜，抗蚀剂组合物，（B）将膜曝光，和（C）使用含有有机溶剂的显影剂显影曝光膜，从而形成 负面模式。 抗蚀剂组合物含有（a）在被酸作用时被分解的树脂，由下式（1）表示的＆Dgr; SP为2.5（MPa）1/2以上，（b） 被组合以在暴露于光化射线或辐射时产生酸，和（c）溶剂。 ＆Dgr; SP = SPF-SPI（1）

公开(公告)号：US09097973B2

公开(公告)日：2015-08-04

申请号：US13172273

申请日：2011-06-29

Applicant: Yuichiro Enomoto ,  Shinji Tarutani ,  Sou Kamimura ,  Kaoru Iwato ,  Keita Kato ,  Kana Fujii

Inventor： Yuichiro Enomoto ,  Shinji Tarutani ,  Sou Kamimura ,  Kaoru Iwato ,  Keita Kato ,  Kana Fujii

IPC: G03F7/42 ,  G03F7/039 ,  G03F7/038 ,  G03F7/32 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

Abstract translation: 提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成为膜，（b）将膜曝光，和（c）用含有机溶剂的显影剂显影曝光的膜，其中 显影剂含有基于显影剂总质量为0至小于500ppm的醇化合物（X）。