发明申请
- 专利标题: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- 专利标题(中): LITHOGRAPHIC装置和装置制造方法
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申请号: US12902847申请日: 2010-10-12
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公开(公告)号: US20110085180A1公开(公告)日: 2011-04-14
- 发明人: Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
- 申请人: Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G01B11/14
- IPC分类号: G01B11/14
摘要:
A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.
公开/授权文献
- US09141003B2 Lithographic apparatus and device manufacturing method 公开/授权日:2015-09-22
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