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公开(公告)号：US20110085180A1
公开(公告)日：2011-04-14
申请号：US12902847
申请日：2010-10-12
申请人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
发明人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
IPC分类号： G01B11/14
CPC分类号： G03F7/7085 , G01B9/02 , G01B9/02049 , G01B11/14 , G01B2290/70 , G03F7/70766 , G03F7/70775
摘要： A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.
摘要翻译： 一种位置测量系统，被配置为在测量方向上测量可移动物体的位置量，所述系统包括辐射源，将测量光束中的辐射束分离的分束器和参考光束，安装在所述测量光束上的第一反射表面 可移动物体以接收测量光束，安装在参考对象上以接收参考光束的第二反射表面;以及检测器，被布置为分别接收由第一和第二反射表面反射的第一和第二反射光束，并且被配置为提供 表示基于第一和第二光束的可移动物体的位置量的信号，其中辐射源和检测器安装在与可移动物体和参考对象不同的物体上。
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公开(公告)号：US09141003B2
公开(公告)日：2015-09-22
申请号：US12902847
申请日：2010-10-12
申请人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
发明人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
CPC分类号： G03F7/7085 , G01B9/02 , G01B9/02049 , G01B11/14 , G01B2290/70 , G03F7/70766 , G03F7/70775
摘要： A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.
摘要翻译： 一种位置测量系统，被配置为在测量方向上测量可移动物体的位置量，所述系统包括辐射源，将测量光束中的辐射束分离的分束器和参考光束，安装在所述测量光束上的第一反射表面 可移动物体以接收测量光束，安装在参考对象上以接收参考光束的第二反射表面;以及检测器，被布置为分别接收由第一和第二反射表面反射的第一和第二反射光束，并且被配置为提供 表示基于第一和第二光束的可移动物体的位置量的信号，其中辐射源和检测器安装在与可移动物体和参考对象不同的物体上。
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公开(公告)号：US08334983B2
公开(公告)日：2012-12-18
申请号：US12768883
申请日：2010-04-28
申请人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
发明人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
IPC分类号： G01B11/02
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.
摘要翻译： 光刻设备具有光学编码器测量系统，其具有将照射束引导到第一刻度的照射系统。 该系统具有光学器件，用于将从第一刻度衍射的主衍射光束照射到第二刻度的照射光束和检测器以检测干涉后的次级衍射光束，并且在第二刻度上进行第二衍射照射束的第二衍射 测量相对于第二刻度的第一刻度的位置。
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公开(公告)号：US20100297561A1
公开(公告)日：2010-11-25
申请号：US12768883
申请日：2010-04-28
申请人： Ruud Antonius Catharina Maria BEERENS , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
发明人： Ruud Antonius Catharina Maria BEERENS , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Fransiscus Mathijs Jacobs
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.
摘要翻译： 光刻设备具有光学编码器测量系统，其具有将照射束引导到第一刻度的照射系统。 该系统具有光学器件，用于将从第一刻度衍射的主衍射光束照射到第二刻度的照射光束和检测器以检测干涉后的次级衍射光束，并且在第二刻度上进行第二衍射照射束的第二衍射 测量相对于第二刻度的第一刻度的位置。
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5.发明授权Lithographic apparatus, method of deforming a substrate table and device manufacturing method 有权平版印刷装置，基板台的变形方法及装置的制造方法公开(公告)号：US09329501B2
公开(公告)日：2016-05-03
申请号：US13494638
申请日：2012-06-12
申请人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
发明人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
CPC分类号： G03F7/7085 , G03F7/70783
摘要： A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
摘要翻译： 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。
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6.发明申请LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD 有权光刻装置，基板的变形方法及装置的制造方法公开(公告)号：US20120327386A1
公开(公告)日：2012-12-27
申请号：US13494638
申请日：2012-06-12
申请人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
发明人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
IPC分类号： G03B27/58
CPC分类号： G03F7/7085 , G03F7/70783
摘要： A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
摘要翻译： 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。
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公开(公告)号：US08687166B2
公开(公告)日：2014-04-01
申请号：US11802770
申请日：2007-05-24
申请人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译： 公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。 编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。
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公开(公告)号：US20080278702A1
公开(公告)日：2008-11-13
申请号：US11797901
申请日：2007-05-08
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Stefan Gertrud Marie Hendriks , Erik Roelof Loopstra , Jacob Willem Vink , Ruud Antonius Catharina Maria Beerens , Lodewijk Alexander Schijvenaars , Tom Van Zutphen
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Stefan Gertrud Marie Hendriks , Erik Roelof Loopstra , Jacob Willem Vink , Ruud Antonius Catharina Maria Beerens , Lodewijk Alexander Schijvenaars , Tom Van Zutphen
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70516
摘要： A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.
摘要翻译： 提供了一种用于校准辅助传感器系统的方法。 辅助传感器系统测量光栅相对于参考的位置，光栅形成编码器测量系统的一部分。 编码器测量系统适于测量光刻设备的衬底台的位置，还包括安装到衬底台的传感器。 该方法包括激励光栅以在辅助传感器系统的至少一个测量方向上移动，在运动期间从传感器系统获得辅助传感器系统输出信号，并且基于输出调整辅助传感器系统的参数 信号，从而校准辅助传感器系统。
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公开(公告)号：US08836913B2
公开(公告)日：2014-09-16
申请号：US13308388
申请日：2011-11-30
申请人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译： 公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。 编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。
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公开(公告)号：US08760615B2
公开(公告)日：2014-06-24
申请号：US12153799
申请日：2008-05-23
申请人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译： 公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。 编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。
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