发明申请
- 专利标题: METHOD FOR FILM FORMATION, APPARATUS FOR FILM FORMATION, AND COMPUTER-READABLE RECORDING MEDIUM
- 专利标题(中): 薄膜形成方法,薄膜形成装置和计算机可读记录介质
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申请号: US12933979申请日: 2009-01-23
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公开(公告)号: US20110092070A1公开(公告)日: 2011-04-21
- 发明人: Masamichi Hara , Yasushi Mizusawa , Satoshi Taga , Atsushi Gomi , Tatsuo Hatano
- 申请人: Masamichi Hara , Yasushi Mizusawa , Satoshi Taga , Atsushi Gomi , Tatsuo Hatano
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2008-084551 20080327
- 国际申请: PCT/JP2009/051088 WO 20090123
- 主分类号: H01L21/3205
- IPC分类号: H01L21/3205 ; C23C16/16
摘要:
Disclosed is a method for film formation, characterized by comprising allowing a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas to flow into a region on the upper outside of the outer periphery of a substrate to be treated in a diameter direction of the substrate while avoiding the surface of the substrate and diffusing the metal carbonyl from the treatment gas stream into the surface of the substrate to form a metal film on the surface of the substrate.