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    Method for Film Formation, Apparatus for Film Formation, and Computer-Readable Recording Medium
    1.
    发明申请
    Method for Film Formation, Apparatus for Film Formation, and Computer-Readable Recording Medium 有权
    成膜方法，成膜装置和计算机可读记录介质

    公开(公告)号：US20110300291A1

    公开(公告)日：2011-12-08

    申请号：US13158180

    申请日：2011-06-10

    申请人： Masamichi Hara ,  Yasushi Mizusawa ,  Satoshi Taga ,  Atsushi Gomi ,  Tatsuo Hatano

    发明人： Masamichi Hara ,  Yasushi Mizusawa ,  Satoshi Taga ,  Atsushi Gomi ,  Tatsuo Hatano

    IPC分类号： H05K3/42

    CPC分类号： C23C16/45559 ,  C23C16/16 ,  H01L21/28562

    摘要： Disclosed is a method for film formation, characterized by comprising allowing a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas to flow into a region on the upper outside of the outer periphery of a substrate to be treated in a diameter direction of the substrate while avoiding the surface of the substrate and diffusing the metal carbonyl from the treatment gas stream into the surface of the substrate to form a metal film on the surface of the substrate.

    摘要翻译： 本发明公开了一种成膜方法，其特征在于，含有含有含羰基金属的处理气体和一氧化碳的载气的处理气体流进入基板的外周的上侧的区域内，为 在衬底的直径方向处理，同时避免衬底的表面并将金属羰基从处理气流扩散到衬底的表面中，以在衬底的表面上形成金属膜。

    PLACING TABLE STRUCTURE
    5.
    发明申请
    PLACING TABLE STRUCTURE 审中-公开
    配置表结构

    公开(公告)号：US20110263123A1

    公开(公告)日：2011-10-27

    申请号：US13057380

    申请日：2009-08-04

    申请人： Atsushi Gomi ,  Yasushi Mizusawa ,  Tatsuo Hatano ,  Masamichi Hara ,  Kaoru Yamamoto ,  Satoshi Taga

    发明人： Atsushi Gomi ,  Yasushi Mizusawa ,  Tatsuo Hatano ,  Masamichi Hara ,  Kaoru Yamamoto ,  Satoshi Taga

    IPC分类号： H01L21/3205 ,  C23C16/458

    CPC分类号： C23C16/52 ,  C23C16/16 ,  C23C16/45514 ,  C23C16/45521 ,  C23C16/45597 ,  C23C16/4585 ,  H01L21/67017 ,  H01L21/68785

    摘要： Provided is a placing table structure which is disposed in a processing container and has a subject to be processed thereon so as to form a thin film on the subject in the processing container by using raw material gas which generates thermal decomposition reaction having reversibility. The placing table structure is provided with a placing table for placing the subject to be processed on a placing surface, i.e., an upper surface of the placing table structure, and a decomposition restraint gas supply means which is arranged in the placing table for the purpose of supplying decomposition restraint gas, which restraints thermal decomposition of the raw material gas, toward a peripheral section of the subject placed on the placing surface of the placing table.

    摘要翻译： 提供了一种放置台结构，其设置在处理容器中并且要对其进行处理，以便通过使用产生具有可逆性的热分解反应的原料气体在处理容器中在被检体上形成薄膜。 放置台结构设置有用于将待处理对象放置在放置表面（即，放置台结构的上表面）的放置台和设置在放置台中的分解限制气体供应装置 提供限制原料气体的热分解的分解约束气体朝向放置在放置台的放置面的被处理体的周边部分。