发明申请
- 专利标题: VERTICAL FILM FORMATION APPARATUS AND METHOD FOR USING SAME
- 专利标题(中): 垂直膜形成装置及其使用方法
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申请号: US12954767申请日: 2010-11-26
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公开(公告)号: US20110129618A1公开(公告)日: 2011-06-02
- 发明人: Masanobu MATSUNAGA , Pao-Hwa Chou , Masato Yonezawa , Masayuki Hasegawa , Kazuhide Hasebe
- 申请人: Masanobu MATSUNAGA , Pao-Hwa Chou , Masato Yonezawa , Masayuki Hasegawa , Kazuhide Hasebe
- 申请人地址: JP Minato-ku
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Minato-ku
- 优先权: JP2009-269830 20091127; JP2010-241831 20101028
- 主分类号: H05H1/24
- IPC分类号: H05H1/24 ; C23C16/02
摘要:
A method for using a vertical film formation apparatus includes performing a coating process inside the process container without product target objects present therein to cover an inner surface of the process container with a coating film, and then performing a film formation process inside the process container accommodating the holder with the product target objects placed thereon to form a predetermined film on the product target objects. The coating process alternately supplies the first and second process gases into the process container without turning either of the first and second process gases into plasma. The film formation process alternately supplies the first and second process gases into the process container while turning at least one of the first and second process gases into plasma.
公开/授权文献
- US08563096B2 Vertical film formation apparatus and method for using same 公开/授权日:2013-10-22