发明申请
- 专利标题: SEMICONDUCTOR DEVICE WITH OXIDE DEFINE PATTERN
- 专利标题(中): 具有氧化物定义图案的半导体器件
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申请号: US13029066申请日: 2011-02-16
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公开(公告)号: US20110133308A1公开(公告)日: 2011-06-09
- 发明人: Kuei-Ti Chan , Tung-Hsing Lee , Augusto Marques , Wen-Chang Lee
- 申请人: Kuei-Ti Chan , Tung-Hsing Lee , Augusto Marques , Wen-Chang Lee
- 主分类号: H01L29/86
- IPC分类号: H01L29/86
摘要:
A semiconductor device includes a substrate; an inductor wiring pattern overlying the substrate, wherein the inductor wiring pattern is formed in an inductor-forming region; a plurality of shielding patterns between the inductor wiring pattern and the substrate within the inductor-forming region; and at least one first oxide define (OD) pattern disposed in the substrate or between the inductor wiring pattern and the substrate.
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