发明申请
- 专利标题: SEMICONDUCTOR MANUFACTURING APPARATUS
- 专利标题(中): 半导体制造设备
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申请号: US13059297申请日: 2008-09-29
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公开(公告)号: US20110140007A1公开(公告)日: 2011-06-16
- 发明人: Yoshiaki Ogino , Katsumi Kimura , Yasuhiro Iida , Kazuhiro Soga
- 申请人: Yoshiaki Ogino , Katsumi Kimura , Yasuhiro Iida , Kazuhiro Soga
- 申请人地址: JP Kanagawa
- 专利权人: HITACHI COMPUTER PERIPHERALS CO., LTD.
- 当前专利权人: HITACHI COMPUTER PERIPHERALS CO., LTD.
- 当前专利权人地址: JP Kanagawa
- 国际申请: PCT/JP2008/067684 WO 20080929
- 主分类号: H01J37/10
- IPC分类号: H01J37/10
摘要:
To project a rectangular laser spot having a predetermined size and a high laser power density onto the surface of an object, a semiconductor manufacturing apparatus comprises a control unit for controlling power of a laser light source, an optical waveguide unit (1) including a core section (10) transmitting laser light and a clad section (11) covering the core section (10), and a lens (3) for forming the laser light output through the optical waveguide unit (1) into a laser spot having a predetermined shape, an output end surface (15) of the core section (10) has a rectangular shape with one side length of 1 μm to 20 μm and the other side length of 1 mm to 60 mm, and the laser source is set to make the power density of the laser spot output from the core section (10) to be 0.1 mW/μm2 or more.
公开/授权文献
- US08644665B2 Semiconductor manufacturing apparatus 公开/授权日:2014-02-04
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