发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND METHOD
- 专利标题（中）： LITHOGRAPHIC设备和方法
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申请号： US13046211申请日： 2011-03-11
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公开(公告)号： US20110222032A1公开(公告)日： 2011-09-15
- 发明人: Nicolaas TEN KATE , Johannes Henricus Wilhelmus JACOBS , Joost Jeroen OTTENS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Thibault Simon Mathieu LAURENT , Robbert Jan VOOGD , Giovanni Francisco NINO , Johan Gertrudis Cornelis KUNNEN , Marinus Jan REMIE
- 申请人： Nicolaas TEN KATE , Johannes Henricus Wilhelmus JACOBS , Joost Jeroen OTTENS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Thibault Simon Mathieu LAURENT , Robbert Jan VOOGD , Giovanni Francisco NINO , Johan Gertrudis Cornelis KUNNEN , Marinus Jan REMIE
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
公开/授权文献
- US09632435B2 Lithographic apparatus and method 公开/授权日：2017-04-25
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