公开(公告)号：US20110222032A1

公开(公告)日：2011-09-15

申请号：US13046211

申请日：2011-03-11

申请人： Nicolaas TEN KATE ,  Johannes Henricus Wilhelmus JACOBS ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Thibault Simon Mathieu LAURENT ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Johan Gertrudis Cornelis KUNNEN ,  Marinus Jan REMIE

发明人： Nicolaas TEN KATE ,  Johannes Henricus Wilhelmus JACOBS ,  Joost Jeroen OTTENS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Thibault Simon Mathieu LAURENT ,  Robbert Jan VOOGD ,  Giovanni Francisco NINO ,  Johan Gertrudis Cornelis KUNNEN ,  Marinus Jan REMIE

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/7085

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

摘要翻译： 公开了一种光刻设备，其包括被配置为在基板支撑区域上支撑基板的基板台和与基板支撑区域相邻的表面上的加热器和/或温度传感器。

公开(公告)号：US20100245791A1

公开(公告)日：2010-09-30

申请号：US12814242

申请日：2010-06-11

申请人： Johannes Henricus Wilhelmus JACOBS ,  Igor Petrus Maria Bouchoms ,  Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Joost Jeroen Ottens ,  Martinus Cornelis Maria Verhagen ,  Yücel Kök ,  Johannes Van Es ,  Herman Boom ,  Fraciscus Johannes Joseph Janssen

发明人： Johannes Henricus Wilhelmus JACOBS ,  Igor Petrus Maria Bouchoms ,  Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Joost Jeroen Ottens ,  Martinus Cornelis Maria Verhagen ,  Yücel Kök ,  Johannes Van Es ,  Herman Boom ,  Fraciscus Johannes Joseph Janssen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.

摘要翻译： 使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。 从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。

公开(公告)号：US20110075118A1

公开(公告)日：2011-03-31

申请号：US12891375

申请日：2010-09-27

申请人： Johannes Henricus Wilhelmus JACOBS ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Gerrit Van Donk ,  Johannes Ven Es

发明人： Johannes Henricus Wilhelmus JACOBS ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Gerrit Van Donk ,  Johannes Ven Es

IPC分类号： G03B27/52 ,  F24H1/10

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70875

摘要： A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.

摘要翻译： 提供了一种光刻设备，其包括被配置为保持基板的基板保持器和用于将基板保持器维持在基本上均匀的温度的热管。 热管具有容纳液体储存器和蒸汽空间的室，以及在室中至少部分地与液体接触的加热元件。

公开(公告)号：US20100302518A1

公开(公告)日：2010-12-02

申请号：US12768902

申请日：2010-04-28

申请人： Jan VAN EIJK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Koen Jacobus Johannes Maria ZAAL ,  Marinus Jan REMIE

发明人： Jan VAN EIJK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Koen Jacobus Johannes Maria ZAAL ,  Marinus Jan REMIE

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70758 ,  G03F7/70858

摘要： The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets.

摘要翻译： 本发明涉及一种布置成将图案从图案形成装置转移到基板上的光刻设备，包括用于冷却光刻设备的一部分的冷却系统，该冷却系统包括液滴喷射器以形成液滴并使液滴朝向冷却 光刻设备的一部分的表面，以通过蒸发液滴来冷却该部件。

公开(公告)号：US20090290137A1

公开(公告)日：2009-11-26

申请号：US12466119

申请日：2009-05-14

申请人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Johannes Henricus Wilhelmus JACOBS ,  Joost Jeroen OTTENS

发明人： Marcus Martinus Petrus Adrianus VERMEULEN ,  Johannes Henricus Wilhelmus JACOBS ,  Joost Jeroen OTTENS

IPC分类号： G03B27/53

CPC分类号： G03F7/70691 ,  G03B27/53 ,  G03F1/66 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

摘要： A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure.

摘要翻译： 用于在光刻曝光设备中支撑可交换物体的支撑结构包括第一支撑结构部分和第二支撑结构部分，第一支撑结构部分被布置成支撑物体，第二支撑结构部分至少布置成 部分地支撑第一支撑结构部分。 第一支撑结构部分和第二支撑结构部分中的至少一个具有开放式框架结构。 第一支撑结构部分和第二支撑结构部分被构造成彼此附接，使得第一支撑结构部分和第二支撑结构一起形成闭合箱结构。

公开(公告)号：US20090279061A1

公开(公告)日：2009-11-12

申请号：US12436635

申请日：2009-05-06

申请人： Johannes Henricus Wilhelmus JACOBS ,  Martinus Hendrikus Antonius Leenders ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

发明人： Johannes Henricus Wilhelmus JACOBS ,  Martinus Hendrikus Antonius Leenders ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.

摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。

公开(公告)号：US20110007287A1

公开(公告)日：2011-01-13

申请号：US12818724

申请日：2010-06-18

申请人： Johannes Henricus Wilhelmus JACOBS ,  Hans Jansen ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Gerardus Adrianus Antonius Maria Kusters ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

发明人： Johannes Henricus Wilhelmus JACOBS ,  Hans Jansen ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Gerardus Adrianus Antonius Maria Kusters ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC分类号： G03B27/58

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.

摘要翻译： 一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。

公开(公告)号：US20100085546A1

公开(公告)日：2010-04-08

申请号：US12572433

申请日：2009-10-02

申请人： Leon VAN DOOREN ,  Johannes Henricus Wilhelmus JACOBS ,  Wouter Andries JONKER

发明人： Leon VAN DOOREN ,  Johannes Henricus Wilhelmus JACOBS ,  Wouter Andries JONKER

IPC分类号： G03B27/52 ,  G01N21/00

CPC分类号： G01N21/39 ,  G01N21/274 ,  G01N21/314 ,  G01N21/3554 ,  G01N2021/399 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70916

摘要： A humidity measurement system for use in, for example, a lithographic apparatus. The humidity measurement system includes a tunable laser diode configured to emit a measurement radiation beam having a wavelength in a wavelength range. The wavelength range includes a first wavelength associated with an absorption peak of water molecules. A signal processing unit is connected to a radiation detector. The signal processing unit is configured to measure an intensity of the measurement radiation beam of the tunable laser diode subjected to absorption. The signal processing unit is also connected to the tunable laser diode for obtaining wavelength information. The signal processing unit is arranged to detect an extreme value in a measured intensity as function of the wavelength and to calculate a humidity value from the detected extreme value.

摘要翻译： 用于例如光刻设备的湿度测量系统。 湿度测量系统包括被配置为发射波长范围内的波长的测量辐射束的可调激光二极管。 波长范围包括与水分子的吸收峰相关联的第一波长。 信号处理单元连接到放射线检测器。 信号处理单元被配置为测量经受吸收的可调谐激光二极管的测量辐射束的强度。 信号处理单元也连接到可调激光二极管以获得波长信息。 信号处理单元被配置为检测作为波长的函数的测量强度中的极值，并根据检测到的极值计算湿度值。

公开(公告)号：US20120097034A1

公开(公告)日：2012-04-26

申请号：US13335129

申请日：2011-12-22

申请人： Martinus Cornelis Maria VERHAGEN ,  Roelof Frederick DE GRAAF ,  Johannes Henricus Wilhelmus JACOBS ,  Franciscus Johannes Herman Maris TEUNISSEN ,  Jurgen BENISCHECK

发明人： Martinus Cornelis Maria VERHAGEN ,  Roelof Frederick DE GRAAF ,  Johannes Henricus Wilhelmus JACOBS ,  Franciscus Johannes Herman Maris TEUNISSEN ,  Jurgen BENISCHECK

IPC分类号： B01D63/00

CPC分类号： G03F7/70341

摘要： An apparatus configured to de-gas a liquid includes a semi-permeable membrane having a first side on which the liquid is provided; and (i) a vaporizer configured to provide vapor of the liquid to a second side of the membrane; or (ii) a gas inlet configured to provide a gas to the second side of the membrane, the gas adapted to dissociate when dissolved in the liquid and an ion exchanger for the liquid downstream of the semi-permeable membrane.

摘要翻译： 一种被配置为对液体进行除气的装置包括具有第一侧的半透膜，液体在其上设置有第一侧; 和（i）蒸发器，其构造成将液体的蒸气提供到膜的第二侧; 或（ii）配置成向膜的第二侧提供气体的气体入口，适于在溶解在液体中时解离的气体和用于半渗透膜下游液体的离子交换器。

公开(公告)号：US20120013870A1

公开(公告)日：2012-01-19

申请号：US13240867

申请日：2011-09-22

申请人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

发明人： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.