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公开(公告)号：US10551752B2
公开(公告)日：2020-02-04
申请号：US13046283
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号： G03F7/20
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US09116446B2
公开(公告)日：2015-08-25
申请号：US13243528
申请日：2011-09-23
CPC分类号： G03F9/7069 , G03F7/70066 , G03F7/7085
摘要： A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus further comprises a patterning device masking blade provided with a hole, a diffusing material being located at the hole.
摘要翻译： 一种光刻设备，包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使辐射束在其横截面上具有图案的图案形成装置，用于保持衬底的衬底台，以及 用于将图案化的辐射束投影到基板的目标部分上的投影系统，其中所述光刻设备还包括设置有孔的图案形成装置掩蔽刮板，位于所述孔处的扩散材料。
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公开(公告)号：US20110222033A1
公开(公告)日：2011-09-15
申请号：US13046283
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US20110222032A1
公开(公告)日：2011-09-15
申请号：US13046211
申请日：2011-03-11
申请人： Nicolaas TEN KATE , Johannes Henricus Wilhelmus JACOBS , Joost Jeroen OTTENS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Thibault Simon Mathieu LAURENT , Robbert Jan VOOGD , Giovanni Francisco NINO , Johan Gertrudis Cornelis KUNNEN , Marinus Jan REMIE
发明人： Nicolaas TEN KATE , Johannes Henricus Wilhelmus JACOBS , Joost Jeroen OTTENS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Thibault Simon Mathieu LAURENT , Robbert Jan VOOGD , Giovanni Francisco NINO , Johan Gertrudis Cornelis KUNNEN , Marinus Jan REMIE
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
摘要翻译： 公开了一种光刻设备，其包括被配置为在基板支撑区域上支撑基板的基板台和与基板支撑区域相邻的表面上的加热器和/或温度传感器。
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公开(公告)号：US20120242967A1
公开(公告)日：2012-09-27
申请号：US13243528
申请日：2011-09-23
IPC分类号： G03B27/54
CPC分类号： G03F9/7069 , G03F7/70066 , G03F7/7085
摘要： A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus further comprises a patterning device masking blade provided with a hole, a diffusing material being located at the hole.
摘要翻译： 一种光刻设备，包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使辐射束在其横截面上具有图案的图案形成装置，用于保持衬底的衬底台，以及 用于将图案化的辐射束投影到基板的目标部分上的投影系统，其中所述光刻设备还包括设置有孔的图案形成装置掩蔽刮板，位于所述孔处的扩散材料。
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公开(公告)号：US09298107B2
公开(公告)日：2016-03-29
申请号：US13183220
申请日：2011-07-14
申请人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
发明人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC分类号： G03F7/20
CPC分类号： G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。
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公开(公告)号：US20120013865A1
公开(公告)日：2012-01-19
申请号：US13183220
申请日：2011-07-14
申请人： Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendricus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
发明人： Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendricus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC分类号： G03B27/52
CPC分类号： G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。
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公开(公告)号：US09632435B2
公开(公告)日：2017-04-25
申请号：US13046211
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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