发明申请
US20110260230A1 CELL WITH SURROUNDING WORD LINE STRUCTURES AND MANUFACTURING METHOD THEREOF
审中-公开
具有周边字线结构的单元及其制造方法
- 专利标题: CELL WITH SURROUNDING WORD LINE STRUCTURES AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 具有周边字线结构的单元及其制造方法
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申请号: US12829674申请日: 2010-07-02
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公开(公告)号: US20110260230A1公开(公告)日: 2011-10-27
- 发明人: TZUNG HAN LEE , CHUNG-LIN HUANG , HSIEN-WEN LIU
- 申请人: TZUNG HAN LEE , CHUNG-LIN HUANG , HSIEN-WEN LIU
- 申请人地址: TW Taoyuan County
- 专利权人: INOTERA MEMORIES, INC.
- 当前专利权人: INOTERA MEMORIES, INC.
- 当前专利权人地址: TW Taoyuan County
- 优先权: TW99112970 20100423
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L21/8242
摘要:
A memory cell with surrounding word line structures includes an active area; a plurality of first trenches formed on the active area in a first direction, each first trench has a bit line on a sidewall therein; a plurality of second trenches formed on the active area in a second direction, each second trench has two word lines formed correspondingly on the sidewalls in the second trench; and a plurality of transistors formed on the active area. The word line pairs are arranged into a surrounding word line structure. The transistor is controlled by the bit line and the two word lines, thus improving the speed of the transistor.
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