发明申请
- 专利标题: Method For Forming Thin Film And Apparatus Therefor
- 专利标题(中): 薄膜形成方法及其设备
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申请号: US13211901申请日: 2011-08-17
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公开(公告)号: US20110297089A1公开(公告)日: 2011-12-08
- 发明人: Masashi UEDA , Tomoko Takagi , Norikazu Ito
- 申请人: Masashi UEDA , Tomoko Takagi , Norikazu Ito
- 申请人地址: JP Koto-ku
- 专利权人: IHI Corporation
- 当前专利权人: IHI Corporation
- 当前专利权人地址: JP Koto-ku
- 优先权: JP2002-292948 20021004
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; C23C16/50 ; C23C16/455 ; C23C16/458 ; B05C9/08 ; B05C13/00
摘要:
A plurality of antenna elements, each of which has first and second linear conductors whose first ends are electrically interconnected are formed. The antenna elements are arranged in plane in such a way that the first and second linear conductors are alternated and separated from one another at regular intervals, thereby forming one or more array antennas which are disposed in a chamber. The second ends of the first linear conductors are connected to a high-frequency power supply, and the second ends of the second linear conductors are connected to ground. A plurality of substrates are parallel placed on both sides of the array antennas at distances approximate to the distances between the linear conductors. A film is formed by introducing an ingredient gas into the chamber.
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