发明申请
- 专利标题: DISPERSIONS OF SUBMICRON DOPED SILICON PARTICLES
- 专利标题(中): 分散的硅酸钠颗粒的分散体
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申请号: US13240785申请日: 2011-09-22
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公开(公告)号: US20120012032A1公开(公告)日: 2012-01-19
- 发明人: Xiangxin Bi , Nobuyuki Kambe , Craig R. Horne , James T. Gardner , Ronald J. Mosso , Shivkumar Chiruvolu , Sujeet Kumar , William E. McGovern , Pierre J. DeMascarel , Robert B. Lynch
- 申请人: Xiangxin Bi , Nobuyuki Kambe , Craig R. Horne , James T. Gardner , Ronald J. Mosso , Shivkumar Chiruvolu , Sujeet Kumar , William E. McGovern , Pierre J. DeMascarel , Robert B. Lynch
- 主分类号: C09D1/00
- IPC分类号: C09D1/00 ; B82Y30/00
摘要:
Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
公开/授权文献
- US08435477B2 Dispersions of submicron doped silicon particles 公开/授权日:2013-05-07
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