发明申请
US20120012977A1 SECURE ANTI-FUSE WITH LOW VOLTAGE PROGRAMMING THROUGH LOCALIZED DIFFUSION HEATING
有权
通过局部扩散加热实现低电压编程的安全保险丝
- 专利标题: SECURE ANTI-FUSE WITH LOW VOLTAGE PROGRAMMING THROUGH LOCALIZED DIFFUSION HEATING
- 专利标题(中): 通过局部扩散加热实现低电压编程的安全保险丝
-
申请号: US12835764申请日: 2010-07-14
-
公开(公告)号: US20120012977A1公开(公告)日: 2012-01-19
- 发明人: Yan Zun Li , Chandrasekharan Kothandaraman , Dan Moy , Norman W. Robson , John M. Safran
- 申请人: Yan Zun Li , Chandrasekharan Kothandaraman , Dan Moy , Norman W. Robson , John M. Safran
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L23/525
- IPC分类号: H01L23/525 ; H01L21/768
摘要:
An antifuse is provided having a unitary monocrystalline semiconductor body including first and second semiconductor regions each having the same first conductivity type, and a third semiconductor region between the first and second semiconductor regions which has a second conductivity type opposite from the first conductivity type. An anode and a cathode can be electrically connected with the first semiconductor region. A conductive region including a metal, a conductive compound of a metal or an alloy of a metal can contact the first semiconductor region and extend between the cathode and the anode. The antifuse can further include a contact electrically connected with the second semiconductor region. In this way, the antifuse can be configured such that the application of a programming voltage between the anode and the cathode heats the first semiconductor region sufficiently to reach a temperature which drives a dopant outwardly therefrom, causing an edge of the first semiconductor region to move closer to an adjacent edge of the second semiconductor region, thus permanently reducing electrical resistance between the first and second semiconductor regions by one or more orders of magnitude.
公开/授权文献
信息查询
IPC分类: