Invention Application
- Patent Title: INTENSITY SELECTIVE EXPOSURE PHOTOMASK
- Patent Title (中): 强度选择性曝光光电
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Application No.: US13281198Application Date: 2011-10-25
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Publication No.: US20120040278A1Publication Date: 2012-02-16
- Inventor: George Liu , Kuei Shun Chen , Chih-Yang Yeh , Te-Chih Huang , Wen-Hao Liu , Ying-Chou Cheng , Boren Luo , Tsong-Hua Ou , Yu-Po Tang , Wen-Chun Huang , Ru-Gun Liu , Shu-Chen Lu , Yu Lun Liu , Yao-Ching Ku , Tsai-Sheng Gau
- Applicant: George Liu , Kuei Shun Chen , Chih-Yang Yeh , Te-Chih Huang , Wen-Hao Liu , Ying-Chou Cheng , Boren Luo , Tsong-Hua Ou , Yu-Po Tang , Wen-Chun Huang , Ru-Gun Liu , Shu-Chen Lu , Yu Lun Liu , Yao-Ching Ku , Tsai-Sheng Gau
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd., ("TSMC")
- Current Assignee Address: TW Hsin-Chu
- Main IPC: G03F1/38
- IPC: G03F1/38

Abstract:
An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask also includes a second region including a second array of sub-resolution features. The second region blocks a second percentage of the incident radiation different that the first percentage.
Public/Granted literature
- US08431291B2 Intensity selective exposure photomask Public/Granted day:2013-04-30
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