发明申请
- 专利标题: Alignment Measurement System, Lithographic Apparatus, and a Method to Determine Alignment in a Lithographic Apparatus
- 专利标题(中): 对准测量系统,平版印刷设备和确定平版印刷设备中对准的方法
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申请号: US13206592申请日: 2011-08-10
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公开(公告)号: US20120062863A1公开(公告)日: 2012-03-15
- 发明人: Franciscus Godefridus Casper BIJNEN , Sami MUSA , David DECKERS
- 申请人: Franciscus Godefridus Casper BIJNEN , Sami MUSA , David DECKERS
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G01J4/00 ; G01B11/02 ; G01B11/00
摘要:
An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.
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