发明申请
US20120062863A1 Alignment Measurement System, Lithographic Apparatus, and a Method to Determine Alignment in a Lithographic Apparatus 有权
对准测量系统,平版印刷设备和确定平版印刷设备中对准的方法

Alignment Measurement System, Lithographic Apparatus, and a Method to Determine Alignment in a Lithographic Apparatus
摘要:
An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.
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