公开(公告)号：US20120133938A1

公开(公告)日：2012-05-31

申请号：US13306668

申请日：2011-11-29

申请人： David DECKERS ,  Franciscus Godefridus Casper BIJNEN ,  Sami MUSA

发明人： David DECKERS ,  Franciscus Godefridus Casper BIJNEN ,  Sami MUSA

IPC分类号： G01N21/84 ,  B29C59/02

CPC分类号： G03F7/70683 ,  G03F1/42 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7076 ,  G03F9/7088

摘要： A pattern formed on a substrate includes first and second sub-patterns positioned adjacent one another and having respective first and second periodicities. The pattern is observed to obtain a combined signal which includes a beat component having a third periodicity at a frequency lower than that of the first and second periodicities. A measurement of performance of the lithographic process is determined by reference to a phase of the beat component. Depending how the sub-patterns are formed, the performance parameter might be critical dimension (CD) or overlay, for example. For CD measurement, one of the sub-patterns may comprise marks each having of a portion sub-divided by product-like features. The measurement can be made using an existing alignment sensor of a lithographic apparatus. Sensitivity and accuracy of the measurement can be adjusted by selection of the first and second periodicities, and hence the third periodicity.

摘要翻译： 形成在基板上的图案包括彼此相邻并且具有相应的第一和第二周期性的第一和第二子图案。 观察该图案以获得组合信号，该组合信号包括频率低于第一和第二周期的频率的第三周期的拍子分量。 通过参考拍子组件的相位来确定光刻工艺的性能的测量。 根据子模式的形成方式，例如，性能参数可能是关键维度（CD）或覆盖。 对于CD测量，子图案之一可以包括每个具有被产品类特征细分的部分的标记。 可以使用光刻设备的现有对准传感器进行测量。 通过选择第一和第二周期性，因此可以调整测量的灵敏度和精度，因此可以调整第三周期性。

公开(公告)号：US20120062863A1

公开(公告)日：2012-03-15

申请号：US13206592

申请日：2011-08-10

申请人： Franciscus Godefridus Casper BIJNEN ,  Sami MUSA ,  David DECKERS

发明人： Franciscus Godefridus Casper BIJNEN ,  Sami MUSA ,  David DECKERS

IPC分类号： G03B27/54 ,  G01J4/00 ,  G01B11/02 ,  G01B11/00

CPC分类号： G03F7/70141 ,  G01B9/02 ,  G01B11/272 ,  G01D5/344 ,  G03F9/7046 ,  G03F9/7088

摘要： An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.

摘要翻译： 对准测量系统测量物体上的对准目标。 测量照亮目标并被反射。 反射的测量光束被分离，其部分被不同的极化。 检测器接收反射的测量光束。 处理单元基于由检测器接收的测量波束来确定对准。 一种替代方案是使用光学色散光纤将从物体反射的多波长测量光束引导到检测器。

公开(公告)号：US20100123886A1

公开(公告)日：2010-05-20

申请号：US12621143

申请日：2009-11-18

申请人： Franciscus Godefridus Casper BIJNEN ,  Jozef Cornelis Antonius Roijers ,  Patrick Warnaar ,  Marc Van Kemenade ,  Hoite Pieter Theodoor Tolsma

发明人： Franciscus Godefridus Casper BIJNEN ,  Jozef Cornelis Antonius Roijers ,  Patrick Warnaar ,  Marc Van Kemenade ,  Hoite Pieter Theodoor Tolsma

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F9/7049 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7084

摘要： A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.

摘要翻译： 一种制造器件的方法包括：提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为所述曝光场的位置标记; 扫描和测量每个曝光场的标记以获得相应曝光场的对准信息; 根据相应曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。

公开(公告)号：US20090051891A1

公开(公告)日：2009-02-26

申请号：US12261663

申请日：2008-10-30

申请人： Franciscus Godefridus Casper BIJNEN ,  Joannes Theodoor De Smit

发明人： Franciscus Godefridus Casper BIJNEN ,  Joannes Theodoor De Smit

IPC分类号： G03B27/80

CPC分类号： G03F7/70291 ,  G03F7/70791 ,  G03F9/7003

摘要： A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks.

摘要翻译： 一种系统和方法使用具有单独的，不分开的对准标记的图案的基板，即标记彼此分开和不同，并且每个标记不分为组成部分。 标记的图案分布在基板的一个区域上，并且该方法还包括以下步骤：使用照明系统和单独可控元件的阵列提供辐射束，以在其横截面中赋予光束图案， 提供投影系统以将图案化的光束投影到基板上，以及提供移动系统以实现基板和投影系统之间的相对移动。 还提供了能够分别检测对准标记的检测系统，并且该方法包括使用检测系统来检测标记以确定基板与投影系统的相对位置，使用移动系统将基板相对定位 并且使用投影系统将图案化的辐射束投影到基板的目标部分上。 该图案包括一行或多行简单对准标记，例如斑点和短线性标记。

公开(公告)号：US20100245792A1

公开(公告)日：2010-09-30

申请号：US12730764

申请日：2010-03-24

申请人： Franciscus Godefridus Casper BIJNEN ,  Richard Johannes Franciscus VAN HAREN ,  Xiuhong WEI

发明人： Franciscus Godefridus Casper BIJNEN ,  Richard Johannes Franciscus VAN HAREN ,  Xiuhong WEI

IPC分类号： G03B27/42 ,  H04N7/18

CPC分类号： G03B27/42 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7092

摘要： An alignment measurement arrangement includes a source, an optical system and a detector. The source generates a radiation beam with a plurality of wavelength ranges. The optical system receives the radiation beam, produces an alignment beam, directs the alignment beam to a mark located on an object, receives alignment radiation back from the mark, and transmits the received radiation. The detector receives the alignment radiation and detects an image of the alignment mark and outputs a plurality of alignment signals, r, each associated with one of the wavelength ranges. A processor, in communication with the detector, receives the alignment signals, determines signal qualities of the alignment signals; determines aligned positions of the alignment signals, and calculates a position of the alignment mark based on the signal qualities, aligned positions, and a model relating the aligned position to the range of wavelengths and mark characteristics, including mark depth and mark asymmetry.

摘要翻译： 对准测量装置包括源，光学系统和检测器。 源产生具有多个波长范围的辐射束。 光学系统接收辐射束，产生对准光束，将对准光束引导到位于物体上的标记，从标记接收对准辐射，并发送接收到的辐射。 检测器接收对准辐射并检测对准标记的图像，并输出多个与波长范围之一相关联的对准信号r。 与检测器通信的处理器接收对准信号，确定对准信号的信号质量; 确定对准信号的对准位置，并且基于信号质量，对准位置以及与对准位置相关联的波长范围和标记特征（包括标记深度和标记不对称性）来计算对准标记的位置。