发明申请
US20120070627A1 METHOD FOR NANOPATTERNING BASED ON SELF ASSEMBLY OF A TRIBLOCK TERPOLYMER
审中-公开
基于自制组装方法进行纳豆化的方法
- 专利标题： METHOD FOR NANOPATTERNING BASED ON SELF ASSEMBLY OF A TRIBLOCK TERPOLYMER
- 专利标题（中）： 基于自制组装方法进行纳豆化的方法
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申请号： US12884600申请日： 2010-09-17
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公开(公告)号： US20120070627A1公开(公告)日： 2012-03-22
- 发明人: Peng-Wei Chuang , Caroline A. Ross , Edwin L. Thomas
- 申请人： Peng-Wei Chuang , Caroline A. Ross , Edwin L. Thomas
- 申请人地址： US MA Cambridge
- 专利权人： Massachusetts Institute of Technology
- 当前专利权人： Massachusetts Institute of Technology
- 当前专利权人地址： US MA Cambridge
- 主分类号： B32B3/10
- IPC分类号： B32B3/10 ; B05D3/00 ; B82Y30/00
摘要：
Nanolithography and nanoscale device features based on a self-assembled film comprising an ABC triblock terpolymer disposed on a substrate surface are provided. The self-assembled film has a controlled pattern of features over the entire film. Each feature comprises block A, block B, or block C of the ABC triblock terpolymer. One or more blocks (A, B, or C) of the self-assembled film can be transformed by, for example, being removed, to provide a particular pattern geometry for nanolithography.
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