发明申请
- 专利标题： PROCESS AND APPARATUS FOR DEPOSITING NANOSTRUCTURED MATERIAL ONTO A SUBSTRATE MATERIAL
- 专利标题（中）： 将纳米结构材料沉积在基材上的工艺和装置
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申请号： US13264718申请日： 2010-04-19
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公开(公告)号： US20120178972A1公开(公告)日： 2012-07-12
- 发明人: Kok Seng Lim , Jonian Ivanov Nikolav
- 申请人： Kok Seng Lim , Jonian Ivanov Nikolav
- 申请人地址： AU Campbell
- 专利权人： Commonwealth Scientific and Industrial Research Organisation
- 当前专利权人： Commonwealth Scientific and Industrial Research Organisation
- 当前专利权人地址： AU Campbell
- 优先权： AU209901632 20090417
- 国际申请： PCT/AU2010/000436 WO 20100419
- 主分类号： C07C31/04
- IPC分类号： C07C31/04 ; B32B5/16 ; B01J37/08 ; B01J21/08 ; B01J29/06 ; B01J21/06 ; B01J27/10 ; B01J27/25 ; C23C16/00 ; B01J21/04 ; B82Y30/00 ; B82Y40/00
摘要：
A process for depositing nanostructured material onto a particulate substrate material comprising the steps of: a) preparing a precursor material; b) forming an atomised dispersion containing nanophased material when subjecting said precursor material to elevated temperature; and c) contacting the atomised dispersion with the substrate material to deposit the nanophased material on the substrate material. The substrate material is in mobile and particulate form for contacting step (c). An apparatus for carrying out the process is also disclosed.