发明申请
- 专利标题: THIN FILM STRUCTURE FOR PHOTOVOLTAIC APPLICATIONS
- 专利标题(中): 光伏应用薄膜结构
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申请号: US13016460申请日: 2011-01-28
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公开(公告)号: US20120192937A1公开(公告)日: 2012-08-02
- 发明人: Mariappan Parans Paranthaman , Sung-Hun Wee , Frederick A. List, III , Claudia Cantoni , Lee Heatherly, JR. , Kyunghoon Kim , Thomas R. Fanning , Jon Bornstein
- 申请人: Mariappan Parans Paranthaman , Sung-Hun Wee , Frederick A. List, III , Claudia Cantoni , Lee Heatherly, JR. , Kyunghoon Kim , Thomas R. Fanning , Jon Bornstein
- 主分类号: H01L31/02
- IPC分类号: H01L31/02 ; H01L31/0368
摘要:
A thin film structure for photovoltaic applications includes a biaxially textured metal substrate; a seed layer epitaxially disposed on the metal substrate; a barrier layer comprising SrTiO3 epitaxially disposed on the seed layer; a cap layer comprising γ-Al2O3 epitaxially disposed on the SrTiO3 barrier layer; and a crystalline silicon layer epitaxially disposed on the cap layer, where the cap layer comprises a volume fraction of biaxial texture of at least about 80% and the crystalline silicon layer does not include a metal silicide phase.
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