A method for manufacturing a wiring board, which prevents electrostatic destruction generated in a mask pattern, by employing a structured exposure mask at a low cost is provided. The method can comprise the steps of forming a photosensitive resin layer on an insulating layer located underneath a predetermined conductor layer, forming a plating resist by exposing and developing the photosensitive resin layer with an exposure light while an exposure mask is disposed on a surface of the photosensitive resin layer, forming a metal plating layer that has a conductor pattern formed by applying a metal plating to an opening of the plating resist, and removing the plating resist. The exposure mask may have a plurality of graphic patterns, and each corner of the graphic patterns maybe chamfered by 50 micrometers or more so that electrostatic destruction due to electric discharge between the adjacent graphic patterns is prevented.