Invention Application
US20120251948A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION
有权
丙烯酸类敏感性或辐射敏感性树脂组合物，以及使用相同组成的丙烯酸类敏感或辐射敏感性膜和图案形成方法
- Patent Title: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION
- Patent Title (中): 丙烯酸类敏感性或辐射敏感性树脂组合物，以及使用相同组成的丙烯酸类敏感或辐射敏感性膜和图案形成方法
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Application No.: US13431736Application Date: 2012-03-27
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Publication No.: US20120251948A1Publication Date: 2012-10-04
- Inventor: Yusuke IIZUKA , Akinori SHIBUYA , Naohiro TANGO , Shohei KATAOKA
- Applicant: Yusuke IIZUKA , Akinori SHIBUYA , Naohiro TANGO , Shohei KATAOKA
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2011-070594 20110328; JP2011-183800 20110825
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/027
Abstract:
The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5) and capable of generating an acid upon irradiation of actinic rays or radiation, wherein the resin (A) contains at least one repeating unit having a group capable of decomposing by the action of an acid to leave a leaving group having a ring structure, and the leaving group having a ring structure has at least one of a polar group as a substituent and a polar atom as a part of the ring structure, and a compound derived from the leaving group having a ring structure has a log P value of not less than 0 and less than 2.8.
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