发明申请
- 专利标题： RESIST COMPOSITION AND PATTERNING PROCESS
- 专利标题（中）： 耐腐蚀组合物和方法
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申请号： US13469929申请日： 2012-05-11
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公开(公告)号： US20120288796A1公开(公告)日： 2012-11-15
- 发明人: Kazuhiro KATAYAMA , Jun Hatakeyama , Youichi Ohsawa , Koji Hasegawa , Tomohiro Kobayashi
- 申请人： Kazuhiro KATAYAMA , Jun Hatakeyama , Youichi Ohsawa , Koji Hasegawa , Tomohiro Kobayashi
- 优先权： JP2011-106011 20110511; JP2011-203162 20110916
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/027
摘要：
A resist composition is provided comprising a polymer comprising recurring units having a hydroxyl group substituted with an acid labile group, an onium salt PAG capable of generating a sulfonic acid, imide acid or methide acid, and an onium salt PAG capable of generating a carboxylic acid. A resist film of the composition is improved in dissolution contrast during organic solvent development, and from which a hole pattern having minimized nano-edge roughness can be formed via positive/negative reversal.
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