发明申请
- 专利标题: METHOD FOR PRODUCING AN OPTOELECTRONIC COMPONENT AND OPTOELECTRONIC COMPONENT
- 专利标题(中): 用于生产光电元件和光电元件的方法
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申请号: US13598896申请日: 2012-08-30
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公开(公告)号: US20120322186A1公开(公告)日: 2012-12-20
- 发明人: Patrick Rode , Martin Strassburg , Karl Engl , Lutz Höppel
- 申请人: Patrick Rode , Martin Strassburg , Karl Engl , Lutz Höppel
- 申请人地址: DE Regensburg
- 专利权人: Osram Opto Semiconductors GmbH
- 当前专利权人: Osram Opto Semiconductors GmbH
- 当前专利权人地址: DE Regensburg
- 优先权: DE102008030584.7 20080627
- 主分类号: H01L33/12
- IPC分类号: H01L33/12
摘要:
In a method for producing an optoelectronic component, a growth substrate having a first coefficient of thermal expansion is provided. A multilayered buffer layer sequence is applied thereto. A layer sequence having a second coefficient of thermal expansion—different than the first coefficient of thermal expansion—is subsequently deposited epitaxially. It furthermore comprises an active layer for emitting electromagnetic radiation. A carrier substrate is subsequently applied on the epitaxially deposited layer sequence. The growth substrate is removed and the multilayered buffer layer sequence is structured in order to increase a coupling-out of electromagnetic radiation. Finally, contact is made with the epitaxially deposited layer sequence.
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