发明申请
- 专利标题： SUBSTRATE TABLE ASSEMBLY, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
- 专利标题（中）： 基板表组件，静态平台设备和设备制造方法
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申请号： US13569926申请日： 2012-08-08
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公开(公告)号： US20130038854A1公开(公告)日： 2013-02-14
- 发明人: Johan Gertrudis Cornelis KUNNEN , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
- 申请人： Johan Gertrudis Cornelis KUNNEN , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/60
- IPC分类号： G03B27/60
摘要：
A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K.
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