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1.发明授权Substrate table assembly, an immersion lithographic apparatus and a device manufacturing method 有权衬底台组件，浸没式光刻设备和器件制造方法公开(公告)号：US09280063B2
公开(公告)日：2016-03-08
申请号：US13569926
申请日：2012-08-08
申请人： Johan Gertrudis Cornelis Kunnen , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70875 , H01L21/683
摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m·K) at 298 K.
摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（m·K ）在298K。
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2.发明申请公开(公告)号：US20180284627A1
公开(公告)日：2018-10-04
申请号：US15932215
申请日：2018-02-16
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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3.发明授权公开(公告)号：US09141005B2
公开(公告)日：2015-09-22
申请号：US13488111
申请日：2012-06-04
申请人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Johan Gertrudis Cornelis Kunnen , Sander Catharina Reinier Derks
发明人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Johan Gertrudis Cornelis Kunnen , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G01K13/00 , G03F7/707
摘要： A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
摘要翻译： 一种温度感测探头，其包括在细长壳体中的温度传感器，其中探针的细长壳体在第一方向上是细长的，并且细长壳体由在20℃具有至少500W / mK的热导率的材料构成 在至少一个方向。
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4.发明申请公开(公告)号：US20130094005A1
公开(公告)日：2013-04-18
申请号：US13586689
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis KUNNEN , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis KUNNEN , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
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5.发明申请公开(公告)号：US20120307216A1
公开(公告)日：2012-12-06
申请号：US13488111
申请日：2012-06-04
申请人： Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria KUSTERS , Johan Gertrudis Cornelis KUNNEN , Sander Catharina Reinier DERKS
发明人： Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria KUSTERS , Johan Gertrudis Cornelis KUNNEN , Sander Catharina Reinier DERKS
CPC分类号： G03F7/70875 , G01K13/00 , G03F7/707
摘要： A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
摘要翻译： 一种温度感测探头，其包括在细长壳体中的温度传感器，其中探针的细长壳体在第一方向上是细长的，并且细长壳体由在20℃具有至少500W / mK的热导率的材料构成 在至少一个方向。
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6.发明授权公开(公告)号：US09897928B2
公开(公告)日：2018-02-20
申请号：US13586728
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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7.发明授权公开(公告)号：US08970822B2
公开(公告)日：2015-03-03
申请号：US13586689
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Martijn Houben , Thibault Simon Mathieu Laurent , Hendrikus Johannes Marinus Van Abeelen , Armand Rosa Jozef Dassen , Sander Catharina Reinier Derks
CPC分类号： G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/68 , H01L21/6875
摘要： A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
摘要翻译： 用于光刻设备的支撑台，支撑台具有支撑部分和调节系统，其中支撑部分，调节系统或两者都被配置成使得热传递到支撑在支撑台上的基板或从支撑在支撑台上的基板，导致 从处理系统的操作来看，在衬底的与衬底边缘相邻的区域中比在衬底中心处的区域更大。
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8.发明申请公开(公告)号：US20130045447A1
公开(公告)日：2013-02-21
申请号：US13586728
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
摘要翻译： 支撑台，其被配置为支撑基板，所述支撑台具有支撑部分以支撑基板和调节系统以向所述支撑部分提供热能和/或从所述支撑部分移除热能，其中所述调节系统包括多个调节单元 这是独立可控的。
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9.发明申请公开(公告)号：US20130038854A1
公开(公告)日：2013-02-14
申请号：US13569926
申请日：2012-08-08
申请人： Johan Gertrudis Cornelis KUNNEN , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis KUNNEN , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
IPC分类号： G03B27/60
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70875 , H01L21/683
摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K.
摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（mK）的热导率， 298 K.
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