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1.发明授权Substrate table assembly, an immersion lithographic apparatus and a device manufacturing method 有权衬底台组件，浸没式光刻设备和器件制造方法公开(公告)号：US09280063B2
公开(公告)日：2016-03-08
申请号：US13569926
申请日：2012-08-08
申请人： Johan Gertrudis Cornelis Kunnen , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70875 , H01L21/683
摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m·K) at 298 K.
摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（m·K ）在298K。
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2.发明申请公开(公告)号：US20130038854A1
公开(公告)日：2013-02-14
申请号：US13569926
申请日：2012-08-08
申请人： Johan Gertrudis Cornelis KUNNEN , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis KUNNEN , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
IPC分类号： G03B27/60
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70875 , H01L21/683
摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K.
摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（mK）的热导率， 298 K.
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公开(公告)号：US08988651B2
公开(公告)日：2015-03-24
申请号：US13242125
申请日：2011-09-23
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译： 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号：US07733459B2
公开(公告)日：2010-06-08
申请号：US10924192
申请日：2004-08-24
申请人： Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Marco Koert Stavenga , Bob Streefkerk , Martinus Cornelis Maria Verhagen , Lejla Seuntiens-Gruda
发明人： Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Marco Koert Stavenga , Bob Streefkerk , Martinus Cornelis Maria Verhagen , Lejla Seuntiens-Gruda
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。
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公开(公告)号：US08976334B2
公开(公告)日：2015-03-10
申请号：US13240908
申请日：2011-09-22
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US08259287B2
公开(公告)日：2012-09-04
申请号：US12081168
申请日：2008-04-11
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译： 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号：US20120008118A1
公开(公告)日：2012-01-12
申请号：US13242125
申请日：2011-09-23
申请人： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel BECKERS , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译： 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号：US07411654B2
公开(公告)日：2008-08-12
申请号：US11098615
申请日：2005-04-05
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译： 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号：US20080212051A1
公开(公告)日：2008-09-04
申请号：US12081168
申请日：2008-04-11
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US20050078286A1
公开(公告)日：2005-04-14
申请号：US10924192
申请日：2004-08-24
申请人： Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Erik Loopstra , Jeroen Johannes Sophia Maria Mertens , Marco Stavenga , Bob Streefkerk , Martinus Cornelis Maria Verhagen , Lejla Seuntiens-Gruda
发明人： Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Erik Loopstra , Jeroen Johannes Sophia Maria Mertens , Marco Stavenga , Bob Streefkerk , Martinus Cornelis Maria Verhagen , Lejla Seuntiens-Gruda
IPC分类号： B01D61/02 , B01D61/24 , C02F1/04 , C02F1/28 , C02F1/32 , C02F1/42 , C02F1/44 , G03F7/20 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.
摘要翻译： 在光刻投影装置中，液体供应系统将液体保持在投影系统和基板之间的空间中。 液体供应系统还可以包括去矿化单元，蒸馏单元，去烃化单元，UV辐射源和/或构造成净化液体的过滤器。 可以提供气体减少装置以减少液体的气体含量。 可以使用添加装置将化学物质添加到液体中以抑制生命形态生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得寿命的增长可能降低。
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