利索-全球专利检索

  1. 登录
  2. 注册
发明申请
US20130180947A1 ETCHING COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 审中-公开
蚀刻组合物和使用其制造显示基板的方法

ETCHING COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME
摘要：
An etching composition that includes, based on the total weight of the etching composition, from about 0.05% to about 15% by weight of a halogen-containing compound, from about 0.1% to about 20% by weight of a nitrate compound, from about 0.1% to about 10% by weight of an acetate compound, from about 0.1% to about 10% by weight of a cyclic amine compound, from about 0% to about 50% by weight of a polyhydric alcohol, and a remainder of water.
摘要（中）：

一种蚀刻组合物，其基于蚀刻组合物的总重量计包含约0.05重量％至约15重量％的含卤素化合物，约0.1重量％至约20重量％的硝酸盐化合物，约为 0.1重量％至约10重量％的乙酸酯化合物，约0.1重量％至约10重量％的环胺化合物，约0重量％至约50重量％的多元醇，剩余的水。

信息查询
Global Dossier Espacenet
0/0