A method for forming a graded matching layer structure is presented. The method includes (a) depositing a first material slurry on at least a portion of a substrate, (b) spreading the first material slurry to a form a first material layer having a first determined thickness, (c) exposing the first material layer using light processed through a determined light pattern mask to form a first matching layer, and (d) repeating steps (a)-(c) with different material slurries to form the graded matching layer structure.