Invention Application
- Patent Title: ELECTRON LENS AND THE ELECTRON BEAM DEVICE
- Patent Title (中): 电子镜头和电子束装置
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Application No.: US14271940Application Date: 2014-05-07
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Publication No.: US20140252245A1Publication Date: 2014-09-11
- Inventor: Hiroshi Yasuda
- Applicant: PARAM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: PARAM CORPORATION
- Current Assignee: PARAM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2010-240408 20101027
- Main IPC: H01J37/143
- IPC: H01J37/143 ; H01J37/30 ; H01J37/317 ; H01J3/24

Abstract:
There provided a device for effectively drawing a fine pattern using a permanent magnet. The device has an outer cylinder 201 composed of a cylindrical ferromagnet with a Z axis as a central axis, a cylindrical permanent magnet 202 located inside the outer cylinder and polarized along the Z axis direction, a correction coil 204 located inside the cylindrical permanent magnet with a gap from the cylindrical permanent magnet, for adjusting a magnetic field strength generated by the cylindrical permanent magnet along the Z axis direction, and a coolant passage 203 located in the gap between the cylindrical permanent magnet and the correction coil, for allowing a coolant to flow therethrough and controlling temperature changes in the cylindrical permanent magnet.
Public/Granted literature
- US09418815B2 Tubular permanent magnet used in a multi-electron beam device Public/Granted day:2016-08-16
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